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Reentrant filling transitions in Lennard-Jones fluids confined in nanoscopic slit-like pores

机译:Lennard-Jones流体中的折返填充转变,其被限制在纳米狭缝状孔中

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摘要

The reentrant first-order pore filling transition in a Lennard-Jones (LJ) fluid confined between the parallel (100) planes of the face centered cubic (fcc) crystal is studied by means of Monte Carlo simulations in the canonical as well as grand canonical ensembles. Slit-like pores of the width allowing for the formation of only three adsorbate layers are used. It is demonstrated that the reentrant first-order pore filling transition, associated with the condensation of the middle layer, appears only when the height of the potential barrier between adjacent sites, V-D, fulfills a condition V-D is an element of[V-D,V-min,V-D,V-max]. The lower limit of V-D (V-D,V-min) is primarily determined by the stability of commensurate monolayers formed at both pore walls during the first step of adsorbate condensation, while the upper limit of V-D (V-D,V-max) depends on the stability of the commensurate three-layer structure. It is also shown that both the misfit between the size of adsorbed atom and the surface lattice as well as the pore width have a great influence on the phase behavior of confined fluids. Moreover, the effects of the phase shift between the confining lattices on the reentrant first-order filling transition are discussed.
机译:通过经典和大经典的蒙特卡罗模拟研究了局限于面心立方(fcc)晶体的平行(100)平面之间的Lennard-Jones(LJ)流体中的折返一阶孔填充过渡合奏。使用宽度仅允许形成三个吸附物层的狭缝状孔。结果表明,仅当相邻位点之间的势垒高度VD满足条件VD是[VD,V- min,VD,V-max]。 VD的下限(VD,V-min)主要取决于在吸附剂冷凝第一步中在两个孔壁处形成的相称单层的稳定性,而VD的上限(VD,V-max)取决于相称的三层结构的稳定性。还表明,吸附原子的大小与表面晶格之间的失配以及孔宽度都对受限流体的相行为有很大影响。此外,讨论了限制晶格之间的相移对折返一阶填充过渡的影响。

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