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首页> 外文期刊>Technical physics letters: Letters to the Russian journal of applied physics >Parameters of silicon carbide diode avalanche shapers for the picosecond range
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Parameters of silicon carbide diode avalanche shapers for the picosecond range

机译:皮秒范围内的碳化硅二极管雪崩整形器的参数

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Parameters of ultrafast avalanche switching of high-voltage diode structures based on 4H-SiC have been estimated theoretically. The calculation was carried out using the analytical theory of the impact ionization wave of the TRAPATT type, which makes it possible to determine the main characteristics of a wave for arbitrary dependences of the impact ionization coefficients and carrier drift velocity on electric field. It is shown that, for a high-voltage (1-10 kV) 4H-SiC structure, the time of switching from the blocking to the conducting state is similar to 10 ps, which is an order of magnitude shorter than that for a Si structure with the same stationary breakdown voltage, and the concentration of the electron-hole plasma created by the wave is two orders of magnitude higher. Picosecond switching times can be reached for 4H-SiC structures with a stationary breakdown voltage exceeding 10 kV.
机译:从理论上估算了基于4H-SiC的高压二极管结构的超快雪崩开关参数。计算是使用TRAPATT型碰撞电离波的分析理论进行的,这使得可以根据碰撞电离系数和载流子漂移速度对电场的任意依赖性来确定电波的主要特性。结果表明,对于高压(1-10 kV)4H-SiC结构,从阻挡状态切换到导通状态的时间类似于10 ps,比Si的时间短一个数量级。具有相同的静态击穿电压的结构,并且由波产生的电子空穴等离子体的浓度高两个数量级。对于静态击穿电压超过10 kV的4H-SiC结构,可以达到皮秒级的切换时间。

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