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Toward efficient Cu(In, Ga)Se-2 solar cells prepared by reactive magnetron co-sputtering from metallic targets in an Ar:H2Se atmosphere

机译:通过在Ar:H2Se气氛中从金属靶材共溅射反应磁控溅射制备的高效Cu(In,Ga)Se-2太阳能电池

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In this paper, we show that a reactive co-sputtering process using metallic CuGa and In targets; an Ar:H2Se atmosphere is well suited for the deposition of photoactive Cu(In, Ga)Se-2 (CIGSe) absorber layers for thin-film solar cells in a single process step. The achievement of single-phase and well-crystallized layers is thereby no major problem if a sufficiently high H2Se content and substrate temperatures in the range of 400-500 degrees C are used. However, in order to achieve the desired Cupoor film stoichiometry, which is crucial for the device performance, it has to be considered already that, at moderate substrate temperatures in the range of 400-500 degrees C, indium has a strong tendency to re-evaporate from the film surface if the film composition is Cu-poor. If excess indium is supplied, this effect can lead to a self-adjustment of the film composition. This allows a very wide process window in a one-stage process concerning the supply ratio from the two targets of [Cu]/([In] + [Ga])(supply) approximate to 0.35-0.8. However, the maximum efficiencies achievable with such a process are limited to 11.7% because an adequate Cu-poor composition can only be achieved with significant Cu-poor conditions, which allow only a low material quality. By using an improved process with an intermediate Cu-rich composition and a final Cupoor stage, the absorber quality could be significantly improved; efficiencies of up to 14.3% have been achieved with CIGSe films prepared on Na-doped Mo back contacts. Copyright (C) 2015 John Wiley & Sons, Ltd.
机译:在本文中,我们显示了使用金属CuGa和In靶的反应性共溅射工艺; Ar:H2Se气氛非常适合在单个工艺步骤中沉积用于薄膜太阳能电池的光敏Cu(In,Ga)Se-2(CIGSe)吸收层。如果使用足够高的H 2 Se含量和400-500℃范围内的衬底温度,则实现单相和良好结晶的层就不是主要问题。但是,为了达到所需的铜镀膜化学计量关系,这对于器件性能至关重要,必须已经考虑到,在400-500摄氏度范围内的中等衬底温度下,铟具有很强的再沉积趋势。如果薄膜组成中的铜含量不足,则会从薄膜表面蒸发掉。如果提供过量的铟,则该效果可导致膜组成的自调节。这样一来,在一个阶段的过程中,涉及到来自[Cu] /([In] + [Ga])(供应)这两个目标的供应比率大约为0.35-0.8的非常宽的过程窗口。然而,由于仅在显着的贫铜条件下才能获得足够的贫铜组成,这只能使材料质量低下,因此该方法可获得的最大效率限于11.7%。通过使用具有富铜中间成分和最后铜阶段的改进工艺,可以显着提高吸收器的质量。在Na掺杂的Mo背触点上制备的CIGSe薄膜的效率高达14.3%。版权所有(C)2015 John Wiley&Sons,Ltd.

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