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首页> 外文期刊>Progress in Organic Coatings: An International Review Journal >Influence of the coating method on the formation of superhydrophobic silicone-urea surfaces modified with fumed silica nanoparticles
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Influence of the coating method on the formation of superhydrophobic silicone-urea surfaces modified with fumed silica nanoparticles

机译:涂覆方法对气相二氧化硅纳米颗粒改性超疏水有机硅-脲表面形成的影响

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摘要

Effect of the coating method on the formation of superhydrophobic polydimethylsiloxane-urea copolymer (TPSC) surfaces, modified by the incorporation of hydrophobic fumed silica nanoparticles was investigated. Four different coating methods employed were: (i) layer-by-layer spin-coating of hydrophobic fumed silica dispersed in an organic solvent onto TPSC films, (ii) spin-coating of silica-polymer mixture onto a glass substrate, (iii) spray coating of silica/polymer mixture by an air-brush onto a glass substrate, and (iv) direct coating of silica-polymer mixture by a doctor blade onto a glass substrate. Influence of the coating method, composition of the polymer/silica mixture and the number of silica layers applied on the topography and wetting behavior of the surfaces were determined. Surfaces obtained were characterized by scanning electron microscopy (SEM), white light interferometry (WLI) and advancing and receding water contact angle measurements. It was demonstrated that superhydrophobic surfaces could be obtained by all methods. Surfaces obtained displayed hierarchical micro-nano structures and superhydrophobic behavior with static and advancing water contact angles well above 150 degrees and fairly low contact angle hysteresis values. (C) 2015 Elsevier B.V. All rights reserved.
机译:研究了涂覆方法对形成超疏水聚二甲基硅氧烷-脲共聚物(TPSC)表面的影响,该表面通过掺入疏水性气相二氧化硅纳米粒子而改性。所采用的四种不同涂覆方法是:(i)将分散在有机溶剂中的疏水性气相法二氧化硅逐层旋涂到TPSC膜上;(ii)将二氧化硅-聚合物混合物旋涂到玻璃基板上;(iii)通过气刷将二氧化硅/聚合物混合物喷涂到玻璃基板上,以及(iv)通过刮刀将二氧化硅-聚合物混合物直接涂覆到玻璃基板上。确定了涂覆方法,聚合物/二氧化硅混合物的组成以及施涂在表面形貌上的二氧化硅层的数量和表面的润湿行为的影响。通过扫描电子显微镜(SEM),白光干涉法(WLI)以及前进和后退的水接触角测量来表征获得的表面。已经证明,可以通过所有方法获得超疏水表面。获得的表面显示出分层的微纳米结构和超疏水行为,其中静态和前进的水接触角远高于150度,并且接触角磁滞值相当低。 (C)2015 Elsevier B.V.保留所有权利。

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