Laser photochemical process of diazonaphthoquinone photopolymer

摘要

Recent years, as rapid development of information science and technology, the study on light information storing material has become an important field. An intense focused monochromatic Ar~+ laser light as the excitation source was sued for exposure of photoresist. The photoresist of diazonaphthoquinone system is the key material for manufacture of the laser recording original disc, micro electric devices, ultra-large-scale integration of high resolution and lithography. The laser photochemical behavior of diazonaphthoquinone photopolymer by exposure of Ar~+ laser was discussed. The sensitive process was studied by laser fluorescence spectrum and laser induced fluorescence attenuation method. The nonlinear relation between photodecomposition rate of photopolymer and laser power, concentration of solution was investigated. Laser characteristic curve and photosensitivity of photopolymer were calculated.