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首页> 外文期刊>Plasma Sources Science & Technology >Observation of multiple charge states and high ion energies in high-power impulse magnetron sputtering (HiPIMS) and burst HiPIMS using a LaB_6 target
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Observation of multiple charge states and high ion energies in high-power impulse magnetron sputtering (HiPIMS) and burst HiPIMS using a LaB_6 target

机译:使用LaB_6目标在大功率脉冲磁控溅射(HiPIMS)和突发HiPIMS中观察多种电荷状态和高离子能量

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The charge-state-resolved ion energies of high-power impulse magnetron sputtering (HiPIMS) discharges were measured, using a LaB_6 target, as a function of charging voltage, pulse length, pulse frequency and 'on/off' time ratio within applied HiPIMS bursts. The highest charge states can reach '+2' and '+3' for boron and lanthanum ions, respectively. At high discharge powers, the B/La ion ratio can exceed the respective atom ratio in the target producing B-rich plasma with up to 98% boron ions. In the case of two-segmented bursts with high 'on/off' time ratios, La~(3+) is the dominating lanthanum ion species and the ion energy distribution of B~+ shows a pronounced high-energy tail extending up to 750 eV. The measured plasma compositions, ion charge states and ion energies are discussed within the established framework of HiPIMS discharges and the recent postulation that potential humps are associated with drifting ionization zones. The recorded high B/La ion ratios are a result of complex effects related to particle fluxes in the HiPIMS plasma of compound targets, as explained with the help of an expanded schematic representation of self-sputtering and gas atom recycling. The high energies of the B~+ ions are based on a combination of the self-sputtering of boron, backscattering of incident boron ions on lanthanum atoms in the target and acceleration by the potential hump. Further evidence for potential humps is provided by the observed charge-state dependence of ion energies and features between the thermal peak and high-energy tail of the ion energy distribution functions.
机译:使用LaB_6靶测量了大功率脉冲磁控溅射(HiPIMS)放电的电荷状态分辨离子能量,该电荷是所施加的HiPIMS中充电电压,脉冲长度,脉冲频率和``开/关''时间比的函数爆发。硼和镧离子的最高电荷态分别可以达到“ +2”和“ +3”。在高放电功率下,B / La离子比可以超过目标中产生高达98%硼离子的富含B的等离子体中的原子比。在具有高“开/关”时间比的两段式猝发情况下,La〜(3+)是主要的镧离子种类,B〜+的离子能量分布显示出明显的高能尾巴,延伸至750 eV。在已建立的HiPIMS放电框架内讨论了测得的等离子体组成,离子电荷状态和离子能量,并在最近的假设中讨论了潜在的驼峰与漂移电离区有关。所记录的高B / La离子比率是与化合物靶标的HiPIMS等离子体中的粒子通量相关的复杂效应的结果,如借助自溅射和气体原子再循环的扩展示意图表示所说明的那样。 B〜+离子的高能是基于硼的自溅射,靶中镧原子上入射硼离子的反向散射以及电势驼峰的加速。观察到的离子能量与电荷状态的依存关系以及离子能量分布函数的热峰和高能尾部之间的关系,为潜在的驼峰提供了进一步的证据。

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