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首页> 外文期刊>Plasma Sources Science & Technology >Fabry-Perot interferometry for measurements of the velocity of sputtered atoms in a magnetron discharge
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Fabry-Perot interferometry for measurements of the velocity of sputtered atoms in a magnetron discharge

机译:Fabry-Perot干涉测量法,用于测量磁控管放电中溅射原子的速度

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摘要

A planar Fabry-Perot interferometer was utilized to measure the velocity distribution function (vdf) of the atoms sputtered in a dc magnetron discharge. The measurements were performed during the sputtering of several metal targets under different discharge conditions such as applied power, working pressure and the distance from the magnetron target. The results demonstrate that there is a considerable shift of the vdf depending on the working pressure and the atomic weight of the sputtered atoms when the line of sight is perpendicular to the target. At the same time the velocity corresponding to the maximum of the vdf does not vary appreciably with the applied power. The typical net velocity of the sputtering atoms was found to be about 2 km s(-1), which is in good agreement with the data obtained recently by other diagnostic methods.
机译:平面法布里-珀罗干涉仪用于测量在直流磁控管放电中溅射的原子的速度分布函数(vdf)。测量是在几种金属靶材在不同放电条件(例如施加的功率,工作压力和距磁控管靶材的距离)的溅射过程中进行的。结果表明,当视线垂直于目标时,取决于工作压力和溅射原子的原子量,vdf会有相当大的偏移。同时,对应于vdf最大值的速度不会随施加的功率而明显变化。发现溅射原子的典型净速度约为2 km s(-1),这与最近通过其他诊断方法获得的数据非常吻合。

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