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Atomic Emission Spectra Diagnosis and Electron Density Measurement of Semiconductor Bridge (SCB) Plasma

机译:半导体桥(SCB)等离子体的原子发射光谱诊断和电子密度测量

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Emission spectra of a semiconductor bridge (SCB) plasma in a visible range was studied in air. The electron density was measured in a conventional way from the broadening of the Al I 394.4 nm Stark width. Based on the Saha equation, a system for recording the intensity of Si I 390.5 nm and Si II 413.1 nm was designed. With this technique, the SCB plasma electron density was measured well and accurately. Moreover, the electron density distribution Vs time was acquired from one SCB discharge. The individual result from the broadening of the Al I 394.4 nm Stark width and Saha equation was all in the range of 10(15) cm(-3) to 10(16) cm(-3). Finally the presumption of the local thermodynamic equilibrium (LTE) condition was validated.
机译:在空气中研究了半导体桥(SCB)等离子体在可见光范围内的发射光谱。从Al I 394.4 nm Stark宽度的加宽以常规方式测量电子密度。基于Saha方程,设计了一种记录Si I 390.5 nm和Si II 413.1 nm强度的系统。用这种技术,可以精确地测量SCB等离子体电子密度。另外,从1次SCB放电获得电子密度分布Vs时间。 Al I 394.4 nm Stark宽度的拓宽和Saha方程的单个结果都在10(15)cm(-3)到10(16)cm(-3)的范围内。最后,对局部热力学平衡(LTE)条件的假设进行了验证。

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