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Effect of the scheme of plasmachemical processes on the calculated characteristics of a barrier discharge in xenon

机译:等离子体化学过程方案对氙势垒放电计算特征的影响

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摘要

The dynamics of a repetitive barrier discharge in xenon at a pressure of 400 Torr is simulated using a one-dimensional drift-diffusion model. The thicknesses of identical barriers with a dielectric constant of 4 are 2 mm, and the gap length is 4 mm. The discharge is fed with an 8-kV ac voltage at a frequency of 25 or 50 kHz. The development of the ionization wave and the breakdown and afterglow phases of a barrier discharge are analyzed using two different kinetic schemes of elementary processes in a xenon plasma. It is shown that the calculated waveforms of the discharge voltage and current, the instant of breakdown, and the number of breakdowns per voltage half-period depend substantially on the properties of the kinetic scheme of plasmacheinical processes.
机译:使用一维漂移扩散模型模拟了氙在压力为400 Torr时的重复势垒放电动力学。介电常数为4的相同势垒的厚度为2 mm,间隙长度为4 mm。放电以8 kV交流电压馈入,频率为25或50 kHz。使用两种不同的基本过程在氙等离子体中的动力学方案,分析了电离波的发展以及势垒放电的击穿和余辉相。结果表明,放电电压和电流的计算波形,击穿的瞬间以及每个电压半周期的击穿次数基本上取决于等离子体化学过程的动力学方案的性质。

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