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Initiation of microplasma discharges at the edge of a dielectric film deposited on a metal surface

机译:在沉积在金属表面上的电介质膜的边缘引发微等离子体放电

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Excitation of microplasma discharges in the interaction of a plasma flow with a metal surface partially covered with a dielectric film is investigated experimentally and theoretically. A new phenomenon-the excitation of microplasma discharges at the boundary between the free metal surface and the area covered with the film-is discovered. Microplasma discharges at the edge of the dielectric film are initiated by a strong electric field that arises between the free metal surface and the outer surface of the film in the interaction with the plasma flow. This field gives rise to surface breakdowns at the film edge, followed by the development of primary microplasma discharges. In turn, the dense plasma of primary microplasma discharges causes secondary microplasma discharges, which also arise at the edge of the dielectric film after the external plasma flow has already terminated. Microplasma discharges gradually evaporate the dielectric film, and the surface cleaned of the film acquires a microrelief due to the local melting and subsequent fast cooling of the metal at the sites of microplasma discharges.
机译:实验和理论上研究了等离子体流与部分覆盖介电膜的金属表面相互作用中的微等离子体放电的激发。发现了一种新现象-在自由金属表面和被膜覆盖的区域之间的边界处激发了等离子体放电。介电膜边缘的微等离子体放电是由与等离子体流相互作用的,在自由金属表面和薄膜外表面之间产生的强电场引发的。该场在膜边缘引起表面击穿,随后形成初级微等离子体放电。继而,初级微等离子体放电的密集等离子体引起次级微等离子体放电,其也在外部等离子体流已经终止之后在电介质膜的边缘处出现。微等离子体放电逐渐使电介质膜蒸发,并且由于微等离子体放电部位的金属的局部熔化和随后的快速冷却,清洁了膜的表面获得了微浮雕。

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