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Effects of si~(3+) and h~+ irradiation on tungsten evaluated by internal friction method

机译:内摩擦法评价si〜(3+)和h〜+辐照对钨的影响

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摘要

Effects of Si~(3+) and H~+ irradiation on tungsten were investigated by internal friction (IF) technique. Scanning electron microscope (SEM) analysis revealed that sequential dual Si+H irradiation resulted in more serious damage than single Si irradiation. After irradiation, the IF background was significantly enhanced. Besides, two obvious IF peaks were initially found in temperature range of 70~~330 K in the sequential Si+H irradiated tungsten sample. The mechanism of increased IF background for the irradiated samples was suggested to originate from the high density dislocations induced by ion irradiation. On the other hand, the relaxation peak PL and non-relaxation peak PH in the Si+H irradiated sample were ascribed to the interaction process of hydrogen atoms with mobile dislocations and transient processes of hydrogen redistribution, respectively. The obtained experimental results verified the high sensitivity of IF method on the irradiation damage behaviors in nuclear materials.
机译:通过内摩擦(IF)技术研究了Si〜(3+)和H〜+辐照对钨的影响。扫描电子显微镜(SEM)分析显示,连续的两次Si + H辐照比单独的Si辐照导致更严重的损坏。辐照后,IF背景显着增强。此外,在连续的Si + H辐射钨样品中,在70 ~~ 330 K的温度范围内最初发现了两个明显的IF峰。提示被辐照样品的IF背景增加的机理源自离子辐照引起的高密度位错。另一方面,被Si + H照射的样品中的弛豫峰PL和非弛豫峰PH分别归因于氢原子与移动位错的相互作用过程和氢再分布的瞬时过程。获得的实验结果证实了中频方法对核材料中辐射损伤行为的高灵敏度。

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