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Mechanisms for p-type behavior of ZnO, Zn1-xMgxO, and related oxide semiconductors

机译:ZnO,Zn1-xMgxO和相关氧化物半导体的p型行为机理

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摘要

The possibilities of turning intrinsically n-type oxide semiconductors like ZnO and Zn1-xMgxO into p-type materials are investigated. Motivated by recent experiments on Zn1-xMgxO doped with nitrogen, we analyze the electronic defect levels of point defects NO, vZn, and NO-vZn pairs in ZnO and Zn1-xMgxO by means of self-interaction-corrected density functional theory calculations. We show how the interplay of defects can lead to shallow acceptor defect levels, although the levels of individual point defects NO are too deep in the band gap to be responsible for p-type conduction. We relate our results to p-type conduction paths at grain boundaries seen in polycrystalline ZnO and develop an understanding of a p-type mechanism which is common to ZnO, Zn1-xMgxO, and related materials.
机译:研究了将诸如ZnO和Zn1-xMgxO之类的本征n型氧化物半导体转变为p型材料的可能性。根据最近对氮掺杂的Zn1-xMgxO进行实验的结果,我们通过自交互校正的密度泛函理论计算来分析ZnO和Zn1-xMgxO中点缺陷NO,vZn和NO-vZn对的电子缺陷水平。我们展示了缺陷的相互作用如何导致浅的受体缺陷水平,尽管单个点缺陷NO的水平在带隙中太深,无法引起p型传导。我们将我们的结果与在多晶ZnO中看到的晶界处的p型传导路径相关联,并发展了对ZnO,Zn1-xMgxO和相关材料共有的p型机理的理解。

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