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MOLECULAR-DYNAMICS SIMULATIONS OF NICKEL OXIDE SURFACES

机译:氧化镍表面的分子动力学模拟

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Molecular-dynamics-simulation techniques have been used to investigate the effect of temperature on the three low index surfaces of nickel oxide. The surface energies for the {100}, {110}, and Ni {111} surfaces have been calculated as a function of temperature for NiO. The surface energies for all three surfaces were essentially constant up to 2000 K, when surface melting was observed for the less densely packed surfaces such as the {110} and Ni {111} surfaces. The {110} surface reconstructed to give {100} microfacets that are densely packed, and hence the surface disorder was less than the Ni {111} surface. The defective (Ni3+) Ni {111} surface showed a similar tendency but was less marked, partly due to the increased charge at the surface. The oxidation energy was negative, indicating that thermodynamically the surface would oxidize. [References: 36]
机译:分子动力学模拟技术已用于研究温度对氧化镍的三个低折射率表面的影响。已经计算出{100},{110}和Ni {111}表面的表面能作为NiO温度的函数。当观察到较低密度堆积的表面(例如{110}和Ni {111}表面)的表面熔化时,所有三个表面的表面能在2000 K以下基本恒定。重建{110}表面以产生{100}微晶面,其紧密堆积,因此表面无序度小于Ni {111}表面。有缺陷的(Ni3 +)Ni {111}表面表现出相似的趋势,但标记较少,部分原因是该表面电荷增加。氧化能为负,表明表面在热力学上会氧化。 [参考:36]

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