The influence of inorganic oxidants and metal ions on semiconductor sensitized photodegradation of 4-fluorophenol

摘要

This paper mainly focuses on the influence of inorganic oxidants and metal ions on the TiO2,ZnO sensitized photodegradation of 4-fluorophenol(4-FP)by UV-A light.TiO2-P25 is more efficient than ZnO.Among the oxidants periodate ion was found to be more efficient than others in improving the degradation of 4-FP via formation of reactive radicals.The effect of oxidants on the degradation of 4-FP was found to be in the order of(IO4)->(BrO3)->(S2O8)2- H2O2>(ClO3)_.The effect of metal ions on degradation of 4-FP was found to be in the order of Mg2+ > Fe3+ > Fe2+ > Cu2+.The degradation of 4-FP follows pseudo-fast order kinetics according to the Langmuir-Hinshelwood model.The photomineralisation has also been confirmed by COD,gas chromatography and fluoride ion measurements.