Deposition of nanocrystalline CNx thin films on Co/Ni-covered substrate by nitrogen-atom-beam-assisted pulsed laser ablation

摘要

CNx thin films were deposited on Co/Ni-covered Si(100) wafers using an nitrogen-atom-beam-assisted pulsed laser ablation deposition method. Transmission electron miscroscopy, X-ray photoelectron spectroscopy and Raman spectroscopy showed that as-deposited films were constructed primarily from CNx crystallites with diameters of 20-30 nm. The co-catalyzation by the cobalt and nickel in the synthesis process is considered to play an important role in the formation of CNx crystallites. The reasons of the formation of CNx crystallites have been analyzed. (C) 2003 Elsevier B.V. All rights reserved. [References: 33]