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Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing

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1.Novel surface imaging process with ion-beam lithography and dry development

机译：具有离子光束光刻和干发射的新型表面成像过程
- 作者：Ulrich A. Jagdhold;Wolfgang Pilz;L.M. Buchmann;M.Torkler Fraunhofer-Institut fuer Mikrostrukturtechnik Berlin 33 Federal Republic of Germany.
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
2.Practical tolerancing and performance implications for XUV projection lithography reduction systems (Poster Paper)

机译：XUV投影光刻减少系统的实用公差和性能影响（海报纸）
- 作者：Vriddhachalam K. Viswanathan
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
3.Model and measurement of resist heating effect in EBL (Poster Paper)

机译：EBL（海报纸）抗蚀剂加热效果的模型及测量
- 作者：Sergei V. Babin;Ivan Kostic;A.A. Svintsov
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
4.Comparative evaluation of e-beam charge-reducing processes

机译：电子束充电减少过程的比较评价
- 作者：Gilles R. Amblard;Laurent A. Guerin;Frederic P. Lalanne;Jean-Pierre Panabiere;Michel E. Guillaume;Philippe Romand;Andre P. Weill
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
5.Single-cycle lithography process for both large and sub-half-micron features (Poster Paper)

机译：大型和次半微米特征的单周期光刻工艺（海报纸）
- 作者：James S. Sewell;Christopher A. Bozada;Mercy H. Styrcula;William E. Davis;Ross W. Dettmer;Robert A. Neidhart
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
6.Computational method for the correction of proximity effect in electron-beam lithography (Poster Paper)

机译：电子束光刻邻近效应的计算方法（海报纸）
- 作者：Chih-Yuan Chang;Geraint Owen;R.F. Pease;Thomas Kailath
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
7.Electron-beam lithography of optical elements for x-ray range (Poster Paper)

机译：用于X射线范围的光学元件的电子束光刻（海报纸）
- 作者：Sergei V. Babin;Alexei I. Erko
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
8.Effects of mounting imperfections on an x-ray lithography mask (Poster Paper)

机译：安装缺陷对X射线光刻面膜的影响（海报纸）
- 作者：Daniel L. Laird;Roxann L. Engelstad
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
9.EB lithography for fabricating a GHz SAW filter on LiTaO3 substrate (Poster Paper)

机译：用于在LIAO3基板上制造GHz SAW滤波器的EB光刻（海报纸）
- 作者：Takeo Nagata;M.M. Kobayashi;Kinjiro Kosemura;M.Y. Satoh;Moritoshi Ando;T.Miyashita Fujitsu Labs. Ltd. Atsugi Japan;O.Ikata Fujitsu Labs. Ltd. Atsugi Japan;Y.Satoh Fujitsu Labs. Ltd. Atsugi Japan.
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
10.Spherical pinch x-ray generator (SPX II): prototype performance for x-ray lithography (Poster Paper)

机译：球形捏X射线发电机（SPX II）：X射线光刻的原型性能（海报纸）
- 作者：Shridar Aithal;Kenji Kawai;M.Lamari Advanced Laser and Fusion Technology Inc. Hull Quebec Canada;Emilio Panarella
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
11.Chromatic and spherical aberration correction in axially symmetric electrostatic lenses

机译：轴对称静电镜片中的彩色和球面像差校正
- 作者：Ivan L. Berry
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
12.Electron-beam lithography system for high-precision reticle making

机译：用于高精度掩模版制造的电子束光刻系统
- 作者：Takashi Matsuzaka;Hiroya Ohta;Norio Saitou;Katsuhiro Kawasaki;Kazumitsu Nakamura;Toshihiko Kohno;Morihisa Hoga
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
13.Analysis of diffraction intensities in the Fresnel region for the x-ray lithography process optimization (Poster Paper)

机译：X射线光刻工艺优化的菲涅耳区域衍射强度分析（海报纸）
- 作者：Hyung J. Yoo
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
14.Impact of CD control on circuit yield in submicron lithography

机译：CD控制对亚微米光刻电路产量的影响
- 作者：Linda Milor
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
15.Optimization of partially coherent illumination in x-ray lithography (Poster Paper)

机译：X射线光刻部分相干照射的优化（海报纸）
- 作者：Franco Cerrina;Jerry Z. Guo
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
16.Resist cross-sectioning using focused ion beams

机译：使用聚焦离子束抵抗横截面
- 作者：Michael J. Vasile
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
17.keV x-ray source based on high-repetition-rate excimer-laser-produced plasmas (Poster Paper)

机译：基于高重复速率准分子激光产生的等离子体（海报纸）的Kev X射线源
- 作者：Robert Fedosejevs;Romuald Bobkowski;James N. Broughton;B.Harwood Univ. of Alberta Edmonton Alberta Canada.
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
18.Performances of the CXrL x-ray beamlines (Poster Paper)

机译：CXRL X射线波束线的性能（海报纸）
- 作者：Richard K. Cole;Paul D. Anderson;Gregory M. Wells;E.Brodsky Univ. of Wisconsin/Madison Stoughton WI USA;K.Yamazaki Univ. of Wisconsin/Madison Stoughton WI USA;Franco Cerrina
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
19.Focused-ion-beam repair of phase-shift photomasks

机译：相移光掩模的聚焦 - 离子束修复
- 作者：Lloyd R. Harriott;Joseph G. Garofalo;Robert L. Kostelak
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
20.Effect of stitching errors on the performance of DFB lasers fabricated using e-beam lithography (Poster Paper)

机译：缝合误差对使用电子束光刻制造的DFB激光器性能的影响（海报纸）
- 作者：Torgil Kjellberg;Richard Schatz;Stefan Nilsson;Bjorn Broberg
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
21.X-ray dose density: a new radiation damage modeling tool (Poster Paper)

机译：X射线剂量密度：一种新的辐射损伤建模工具（海报纸）
- 作者：Author(s): F.Baszler Univ. of Wisconsin/Madison Stoughton WI USA;Mumit Khan;Franco Cerrina
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
22.Study of large-field beryllium window for SR lithography (Poster Paper)

机译：用于SR光刻的大野铍窗口研究（海报纸）
- 作者：Kouichi Hara;Tohru Itoh
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
23.Finite element analysis of dynamic thermal distortions of an x-ray mask for synchrotron radiation lithography

机译：用于同步辐射光刻的X射线掩模动态热扭曲的有限元分析
- 作者：Eric A. Haytcher;Roxann L. Engelstad;N.M. Schnurr
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
24.Study of single-layer e-beam lithography for x-ray mask making

机译：X射线掩模制作单层电子梁光刻研究
- 作者：Yukiko Kikuchi;Yuji Takigami;Ichiro Mori;Yoshio Gomei
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
25.E-beam lithography at low voltages

机译：低电压下的电子束光刻
- 作者：Yuhey Lee;Raymond Browning;R.F. Pease
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
26.Mix-and-match lithography in a manufacturing environment

机译：在制造环境中混合和匹配光刻
- 作者：Warren W. Flack;David H. Dameron;Valerie J. Alameda;Ghassan C. Malek
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
27.Scanning tunneling microscope lithography: a viable lithographic technology?

机译：扫描隧道显微镜光刻：一种可行的光刻技术？
- 作者：Christie R. Marrian;Elizabeth A. Dobisz;J.A. Dagata
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
28.Advanced e-beam systems for manufacturing

机译：用于制造的先进电子束系统
- 作者：Hans Pfeiffer
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
29.Low-damage anisotropic radical-beam ion-beam etching and selective chemical etching of focused-ion-beam-damaged GaAs substrates

机译：低损伤各向异性自由基束离子束蚀刻和聚焦离子束损坏的GAAs基材的选择性化学蚀刻
- 作者：Jay A. Skidmore;Guy D. Spiers;John H. English;Zheng Xu;Craig B. Prater;Larry A. Coldren;Evelyn L. Hu;Pierre M. Petroff
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
30.Focused-ion-beam cross-sectioning techniques using XeF2

机译：使用XeF2的聚焦离子束横截面技术
- 作者：Diane K. Stewart;Michael J. Vasile
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
31.ALF: a facility for x-ray lithography (II): a progress report

机译：ALF：X射线光刻（II）的设施：进度报告
- 作者：L.G. Lesoine;Kenneth W. Kukkonen;Jeffrey A. Leavey
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
32.Design of synchrotron x-ray lithography beamlines

机译：Synchrotron X射线光刻光束线的设计
- 作者：James M. Oberschmidt;Robert P. Rippstein;Raymond R. Ruckel;Alek C. Chen;John C. Granlund;Alfred E. Palumbo
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
33.Implementation of two-state alignment system into CXrL aligner (Poster Paper)

机译：将两个状态对准系统的实现为CXRL对准器（海报纸）
- 作者：Guan J. Chen;D.Bodoh Univ. of Wisconsin/Madison Stoughton WI USA;John P. Wallace;Paul D. Anderson;Michael T. Reilly;R.Nachman Univ. of Wisconsin/Madison Stoughton WI USA;Franco Cerrina
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
34.Why bother with x-ray lithography?

机译：为什么X射线光刻打扰？
- 作者：Henry I. Smith;Mark L. Schattenburg
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
35.Simulation fidelity in microlithography

机译：微光刻中的仿真保真度
- 作者：Eytan Barouch;Uwe Hollerbach;Steven A. Orszag;Martin C. Peckerar;Milton Rebbert
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
36.Manufacturing implementation of deep-UV lithography for 500-nm devices

机译：500纳米器件的深紫色光刻制造实施
- 作者：Steven J. Holmes;Albert S. Bergendahl;Diana D. Dunn;J.Guidry IBM General Technology Div. Essex Junction VT USA;Mark Hakey;Karey L. Holland;R.Horr IBM General Technology Div. Essex Junction VT USA;Dean Humphrey;Stephen E. Knight;D.Macaluso IBM General Technology Div. Essex Junction VT USA;Katherine C. Norris;Dennis Poley;Paul Rabidoux;John Sturtevant;Dean Writer
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
37.Practical evaluation of 16M-DRAMs production with i-line phase-shift lithography

机译：用I-LINE相移光刻进行16M-DRAM生产的实际评估
- 作者：Akihiro Usujima;Ryuji Tazume;Tatsuji Araya;Yoshimi Shioya;Kazumasa Shigematsu
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
38.MEBES IV: a new-generation raster-scan electron-beam lithography system

机译：MEBES IV：一种新一代光栅扫描电子束光刻系统
- 作者：Frank E. Abboud;John T. Poreda;R.L. Smith
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
39.Resist optimization for SOR x-ray lithography using an orthogonal experimental design

机译：使用正交实验设计抵抗SOR X射线光刻的优化
- 作者：Whitson G. Waldo;Ahmad D. Katnani;Harbans S. Sachdev
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
40.Development of XUV projection lithography at 60-80 nm (Poster Paper)

机译：在60-80 nm（海报纸）的XUV投影光刻的开发
- 作者：Brian E. Newnam;Vriddhachalam K. Viswanathan
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1992年
41.Helios compact synchrotron x-ray source: one year of operation at ALF

机译：Helios Compact Synchrotron X射线来源：ALF的一年
- 作者：David E. Andrews;C.N. Archie
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
42.Properties of thin SiC membrane for x-ray mask

机译：X射线面膜薄SiC膜的性质
- 作者：Tsutomu Shoki;Hiroyuki Nagasawa;Hiroyuki Kosuga;Yoh-ichi Yamaguchi;Noromichi Annaka;Isao Amemiya;Osamu Nagarekawa
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
43.Fabrication of x-ray masks with 0.15-um level two-dimensional patterns by using highly accurate FIB lithography

机译：通过使用高精度的FIB光刻制造具有0.15微米的二维图案的X射线掩模
- 作者：Shuji Fujiwara;Y.Yamaoka SANYO Electric Co. Ltd. Ibaraki Japan;M.Harada SANYO Electric Co. Ltd. Ibaraki Japan;Junichi Nishino;R.Yuasa SANYO Electric Co. Ltd. Ibaraki Japan;M.Inai SANYO Electric Co. Ltd. Ibaraki Japan;S.Suzuki SANYO Electric Co. Ltd. Ibaraki Japan;T.Tanaka SORTEC Corp. Ibaraki Japan;M.Morigami SORTEC Corp. Ibaraki Japan;Takeo Watanabe;Y.Yamashita SORTEC Corp. Ibaraki Japan.
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
44.Exposure and resist-process condition dependence of replicated-pattern accuracy in SR lithography

机译：曝光和抗蚀过程条件依赖于SR光刻中的复制图案精度的依赖性
- 作者：Author(s): M.Morigami SORTEC Corp. Ibaraki Japan;T.Tanaka SORTEC Corp. Ibaraki Japan;Takeo Watanabe;Y.Yamashita SORTEC Corp. Ibaraki Japan;Shuji Fujiwara;Junichi Nishino;M.Harada SANYO Electric Co. Ltd. Ibaraki Japan;Y.Yamaoka SANYO Electric Co. Ltd. Ibaraki Japan;R.Yuasa SANYO Electric Co. Ltd. Ibaraki Japan;M.Inai SANYO Electric Co. Ltd. Ibaraki Japan;S.Suzuki SANYO Electric Co. Ltd. Ibaraki Japan.
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
45.Optimization of low-voltage electron optics

机译：低压电子光学优化
- 作者：Laurence S. Hordon;Zirong Huang;Raymond Browning;Nadim I. Maluf;R.F. Pease
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
46.Thin silicon nitride films to increase resolution in e-beam lithography

机译：薄的氮化硅薄膜以增加电子束光刻中的分辨率
- 作者：Elizabeth A. Dobisz;Christie R. Marrian;R.E. Salvino;M.A. Ancona;K.W. Rhee;Martin C. Peckerar
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
47.Process latitude study of focused ion-beam-deposited gold for clear x-ray mask repair

机译：透明X射线掩模修复聚焦离子束沉积金的过程纬度研究
- 作者：Patricia G. Blauner;Andrew D. Dubner;Alfred Wagner
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
48.Dual exposure (e-beam and i-line) of OCG-895i resist

机译：OCG-895I抗蚀剂的双曝光（电子束和I线）
- 作者：Richard J. Bojko;Graham M. Pugh
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
49.Characteristics of the spherical pinch plasma radiation source (SPX II) for x-ray UV and deep-UV lithography

机译：X射线UV和深紫色光刻的球形捏等离子体辐射源（SPX II）的特征
- 作者：Shridar Aithal;Emilio Panarella;M.Lamari Advanced Laser and Fusion Technology Inc. Hull Quebec Canada;B.Hilko Advanced Laser and Fusion Technology Inc. Hull Quebec Canada;Robert B. McIntosh
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
50.Image formation in capillary arrays: the Kumakhov lens

机译：毛细管阵列的图像形成：Kumakhov镜头
- 作者：Guan J. Chen;Richard K. Cole;Franco Cerrina
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
51.Resolution limitation of x-ray proximity lithography--secondary electron and waveguide effects

机译：X射线接近光刻的分辨率限制 - 二次电子和波导效应
- 作者：Taro Ogawa;Seiichi Murayama;Kozo Mochiji;Eiji Takeda
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
52.What is required for collimated point-source x-ray lithography to achieve an economically viable throughput?

机译：准直点源X射线光刻需要什么，以实现经济上可行的吞吐量？
- 作者：Edward D. Franco;Michael Boyle;Jonathan A. Kerner;Louis N. Koppel;Robert D. Ormond
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
53.Accelerated radiation damage testing of x-ray mask membrane materials

机译：X射线掩模膜材料的加速辐射损伤试验
- 作者：Philip A. Seese;Kevin D. Cummings;Douglas J. Resnick;Arnold W. Yanof;William A. Johnson;Gregory M. Wells;John P. Wallace
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
54.Mixed e-beam/optical lithography process for the fabrication of sub-0.25-um poly gates

机译：混合电子束/光学光刻工艺用于制备Sub-0.25-UM多晶硅栅极
- 作者：Keith T. Kwietniak;Michael G. Rosenfield;Philip J. Coane;Christopher R. Blair;David P. Klaus
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
55.Highly accurate calibration method of electron-beam cell projection lithography

机译：电子束电池投影光刻高度精确的校准方法
- 作者：Yoshinori Nakayama;Yasunari Sohda;Norio Saitou;Hiroyuki Itoh
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
56.Electrical and SEM testing of absorber defectivity in the plated-gold process for x-ray masks

机译：电气和SEM对X射线面罩的镀金金工艺中的吸收器缺陷测试
- 作者：Arnold W. Yanof;W.Dauksher Motorola Inc. Tempe AZ USA;Jack Livingston;L.Genduso Motorola Inc. Tempe AZ USA.
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
57.Development of a polycapillary collimator for point-source x-ray lithography

机译：用于点源X射线光刻的多毛细管准直器的研制
- 作者：Michael H. Vartanian;David M. Gibson;Robert D. Frankel;Jerry P. Drumheller
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
58.Silylation and dry development of e-beam resist

机译：电子束抗蚀剂的甜菜碱和干燥发展
- 作者：Lothar Bauch;M.Boettcher Institut fuer Halbleiterphysik GmbH Frankfurt (Oder) Federal Republic of Germany;A.Wolff Institut fuer Halbleiterphysik GmbH Frankfurt (Oder) Federal Republic of Germany;Ulrich A. Jagdhold;I.Ludwig Allresist GmbH Berlin Federal Republic of Germany;Georg G. Mehliss
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
59.Achieving superior MEBES performance through the use of SPC programs and state-of-the-art facilities

机译：通过使用SPC计划和最先进的设施实现卓越的MEBES性能
- 作者：Linda A. Braz
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
60.Fabrication of high-density SRAM chips using mix-and-match x-ray lithography

机译：使用混合和匹配X射线光刻制备高密度SRAM芯片
- 作者：John F. Conway;C.N. Alcorn;D.D. Patel;J.A. Ricker;R.C. Yandow;Liang-Choo Hsia;Alex L. Flamholz
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
61.Fully-scaled 0.25-micron bipolar technology using variable shaped electron-beam lithography

机译：使用可变形电子束光刻完全缩放的0.25微米双极技术
- 作者：Philip J. Coane;Kaolin G. Chiong;Mary B. Rothwell;James Warnock;John Cressler;Fritz J. Hohn;Michael G. Thomson
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
62.EBES4: performance of a new e-beam reticle generator

机译：EBES4：新型电子束掩模版发生器的性能
- 作者：Darryl W. Peters;D.C. Fowlis;C.M. Rose;A.R. von Neida;Herbert A. Waggener;William P. Wilson
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
63.Mask-to-wafer alignment using x-ray-printed alignment marks in x-ray lithography

机译：使用X射线光刻中使用X射线印刷对齐标记的掩模到晶片对齐
- 作者：Liang-Choo Hsia;Alex L. Flamholz;John F. Conway
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
64.Film life enhancement of chemically amplified electron-beam resists

机译：薄膜寿命增强化学放大的电子束抗蚀剂
- 作者：Theodore H. Fedynyshyn;Michael F. Cronin;James W. Thackeray
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
65.Proximity effect correction in electron-beam lithography II

机译：电子束光刻II中的接近效应校正
- 作者：Geraint Owen
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
66.0.35-um rule high-density full-chip x-ray mask patterning

机译：0.35-UM规则高密度全芯片X射线面罩图案
- 作者：Tatsuo Chijimatsu;Kenichi Kawakami;Masafumi Nakaishi;Kazuaki Kondo;Masaaki Nakabayashi;Masaki Yamabe;Kenji Sugishima
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
67.Resist performance in soft x-ray projection lithography

机译：软X射线投影光刻中的抗蚀剂性能
- 作者：Glenn D. Kubiak;Daniel A. Tichenor;Weng W. Chow;William C. Sweatt;Marc D. Himel
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
68.Soft x-ray (14 nm) lithography with ultrathin imaging layers and selective electroless metallization

机译：具有超薄成像层和选择性化学金属化的软X射线（14nm）光刻
- 作者：Jeffrey M. Calvert;T.S. Koloski;Walter J. Dressick;Charles S. Dulcey;Martin C. Peckerar;Franco Cerrina;James W. Taylor;Doowon Suh;Obert R. Wood;Alastair A. MacDowell;R.M. DSouza
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
69.Absorber roughness effect in XRL image formation

机译：XRL图像形成中的吸收粗糙度效应
- 作者：Jerry Z. Guo;Franco Cerrina
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
70.0.25-um x-ray mask repair with focused ion beams

机译：0.25-UM X射线面罩修复，具有聚焦离子束
- 作者：Diane K. Stewart;Thomas Olson;Billy Ward
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
71.Comparative study of MEBES III and CORE 2564 performance in a manufacturing environment

机译：MEBES III和核心2564在制造环境中的比较研究
- 作者：Theron L. Felmlee;Vijaya N. Raghavan
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
72.Chemically assisted focused-ion-beam etching for tungsten x-ray mask repair

机译：用于钨X射线掩模修复的化学辅助聚焦离子束蚀刻
- 作者：Lloyd R. Harriott;R.R. Kola;George K. Celler
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
73.Effects of absorber topography and multilayer coating defects on reflective masks for soft x-ray/EUV projection lithography

机译：吸收剂形貌和多层涂层缺陷对软X射线/ EUV投影光刻反射掩模的影响
- 作者：Khanh B. Nguyen;Alfred K. Wong;Andrew R. Neureuther;David T. Attwood
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
74.X-ray mask metrology: the development of linewidth standards for x-ray lithography

机译：X射线掩模计量：X射线光刻线宽标准的开发
- 作者：Michael T. Postek;Jeremiah R. Lowney;Andras Vladar;William J. Keery;Egon Marx;Robert D. Larrabee
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
75.Effects of illumination system aberrations on proximity XRL images

机译：照明系统像差对近XRL图像的影响
- 作者：Jerry Z. Guo;JiaBei Xiao;Franco Cerrina;Whitson G. Waldo
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
76.Effects of electron energy in nanometer-scale lithography

机译：电子能量在纳米级光刻中的影响
- 作者：T.J. Stark;T.M. Mayer;D.P. Griffis;Phillip E. Russell
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年
77.Photoresist process latitude optimization for synchrotron x-ray lithography

机译：Synchrotron X射线光刻的光刻胶过程纬度优化
- 作者：Andrew T. Pomerene;David E. Seeger;Patricia G. Blauner
- 会议名称：《Conference on electron-beam, x-ray, and lon-beam submicrometer lithographies for manufacturing》 | 1993年