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Pragmatic Integration of an SRAM Row Cache in Heterogeneous 3-D DRAM Architecture Using TSV

机译:使用TSV的异构3D DRAM架构中的SRAM行缓存的实用集成

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As scaling DRAM cells becomes more challenging and energy-efficient DRAM chips are in high demand, the DRAM industry has started to undertake an alternative approach to address these looming issues—that is, to vertically stack DRAM dies with through-silicon-vias (TSVs) using 3-D-IC technology. Furthermore, this emerging integration technology also makes heterogeneous die stacking in one DRAM package possible. Such a heterogeneous DRAM chip provides a unique, promising opportunity for computer architects to contemplate a new memory hierarchy for future system design. In this paper, we study how to design such a heterogeneous DRAM chip for improving both performance and energy efficiency. In particular, we found that, if we want to design an SRAM row cache in a DRAM chip, simple stacking alone cannot address the majority of traditional SRAM row cache design issues. In this paper, to address these issues, we propose a novel floorplan and several architectural techniques that fully exploit the benefits of 3-D stacking technology. Our multi-core simulation results with memory-intensive applications suggest that, by tightly integrating a small row cache with its corresponding DRAM array, we can improve performance by 30% while saving dynamic energy by 31%.
机译:随着扩展DRAM单元变得越来越具有挑战性,并且对高能效DRAM芯片的需求也越来越高,DRAM行业已开始采取替代方法来解决这些迫在眉睫的问题,即通过硅通孔(TSV)垂直堆叠DRAM管芯。 )使用3-D-IC技术。此外,这种新兴的集成技术还使在一个DRAM封装中实现异类芯片堆叠成为可能。这种异构DRAM芯片为计算机架构师提供了一个独特的,有前途的机会,可以为未来的系统设计考虑新的存储器层次结构。在本文中,我们研究了如何设计这样的异构DRAM芯片以同时提高性能和能效。特别是,我们发现,如果要在DRAM芯片中设计SRAM行高速缓存,仅靠简单的堆栈无法解决大多数传统的SRAM行高速缓存设计问题。在本文中,为了解决这些问题,我们提出了一种新颖的平面图和几种可充分利用3-D堆叠技术优势的架构技术。我们对内存密集型应用程序的多核仿真结果表明,通过将小型行缓存与其对应的DRAM阵列紧密集成,我们可以将性能提高30%,同时将动态能源节省31%。

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