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Structural, electrical and surface morphological studies of Cd2SnO4 and Mg doped Cd2SnO4 thin films

机译:Cd 2 SnO 4 和掺Mg的Cd 2 SnO 4 薄膜的结构,电学和表面形态研究

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摘要

The technologically important conductive Cadmium stannate (Cd2SnO4) and Magnesium doped cadmium stannate (Cd2SnO4: Mg) thin films were prepared using Cadmium acetate and stannous chloride by spray pyrolysis technique. Films prepared are crystalline and have cubic CdO phase with SnO2. The X-ray diffraction patterns of both thin films shows perfect crystalline structure and from the data, the particle diameter of both films were calculated. Atomic Force Microscopy (AFM) of both films reveals the uniform thickness of the films and the presence of uniform grain growth in Cd2SnO4 and Mg doped Cd2SnO4 thin films. Thickness of Cadmium stannate film is 725nm and that of Magnesium doped Cadmium stannate film is 285nm. The indirect band gap energy of Cd2SnO4 film is 2.71eV and for magnesium doped Cd2SnO4 is 2.97eV were observed from the UV-Visible absorption spectrum studies. Presence of uniform grain growth is found in both thin films. The doping of Magnesium in Cadmium stannate film improves the electrical properties without affecting its structural properties.
机译:具有技术重要性的导电性锡酸镉(Cd 2 SnO 4 )和镁掺杂的锡酸镉(Cd 2 SnO 4 :Mg)薄膜是使用乙酸镉和氯化亚锡通过喷雾热解技术制备的。制备的薄膜为晶体,具有立方锡镉相和SnO 2 。两种薄膜的X射线衍射图均显示出完美的晶体结构,并根据数据计算了两种薄膜的粒径。两种膜的原子力显微镜(AFM)都显示出膜的厚度均匀,并且在Cd 2 SnO 4 和掺Mg的Cd 2中存在均匀的晶粒生长 SnO 4 薄膜。锡酸镉膜的厚度为725nm,镁掺杂锡酸镉膜的厚度为285nm。 Cd 2 SnO 4 膜的间接带隙能为2.71eV,镁掺杂的Cd 2 SnO 4 从UV-可见吸收光谱研究中观察到为2.97eV。在两个薄膜中均存在均匀的晶粒生长。在锡酸镉膜中掺杂镁可改善电性能,而不会影响其结构性能。

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