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Gas-Phase Nature of Si-N Bond Formation in the Self-Propagating High-Temperature Synthesis of Silicon Nitride by the Azide Method

机译:叠氮化法自蔓延高温合成氮化硅中Si-N键形成的气相性质

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摘要

This study has demonstrated the possibility of the gas-phase nitrogenation of a volatile silicon-containing compound under spark and RF discharge conditions. This reaction yields electronically excited SiN radicals. Therefore, silicon nitride formation in the azide process can take place in the gas phase. The condensation of the gaseous product affords a nanosized powder [3]. Ammonium chloride has a much greater nitrogenizing capacity than sodium azide.
机译:这项研究证明了在火花和RF放电条件下将挥发性含硅化合物进行气相氮化的可能性。该反应产生电子激发的SiN自由基。因此,叠氮化物过程中氮化硅的形成可以在气相中发生。气态产物的冷凝得到纳米级粉末[3]。氯化铵的氮化能力比叠氮化钠大得多。

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  • 来源
    《Theoretical foundations of chemical engineering》 |2010年第4期|p.458-460|共3页
  • 作者单位

    Institute of Structural Macrokinetics and Materials Research Problems, Russian Academy of Sciences, Chernogolovka, Moscow oblast, 142432 Russia;

    Institute of Structural Macrokinetics and Materials Research Problems, Russian Academy of Sciences, Chernogolovka, Moscow oblast, 142432 Russia;

    Institute of Structural Macrokinetics and Materials Research Problems, Russian Academy of Sciences, Chernogolovka, Moscow oblast, 142432 Russia;

    Institute of Structural Macrokinetics and Materials Research Problems, Russian Academy of Sciences, Chernogolovka, Moscow oblast, 142432 Russia;

    Samara State Technical University, Molodogvardeiskaya ul. 224, Samara, 443030 Russia;

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