Effect of surface steps on sputtering and surface defect formation: molecular-dynamics study of 5 keV Xe~+ bombardment of Pt(111) at glancing incidence angles

摘要

Using molecular-dynamics simulation, we study sputtering and defect formation induced by 5 keV Xe~+ ion impact on a Pt(111) surface at oblique and glancing incidence angles. Impact on a terrace produces yield maxima at v = 60-65° incidence angle towards the surface normal. Beyond 75-80°, no damage is produced due to projectile ion reflection. Impact on a dense-packed step, however, produces defects in sizeable numbers up to glancing incidence, v = 85°. The dependence of the yields on the incidence angle and distance of the impact point of the projectile to the step are discussed.