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Effects of interfacial interaction potential on the sublimation rates of TNT films on a silica surface examined by QCM and AFM techniques

机译:用QCM和AFM技术研究界面相互作用势对TNT膜在二氧化硅表面升华速率的影响。

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摘要

The study of 2,4,6-trinitrotoluene (TNT) sublimation rates from the bulk surface and a substrate surface have been evaluated quantitatively with both atomic force microscopy and quartz crystal microbalance (QCM) techniques. A first principle theoretical model is proposed, which allows obtaining three critical parameters, bulk sublimation rate, surface interaction potential, and the effective decay length, with no arbitrary parameters. The bulk sublimation rate predicted by the model is quantitatively confirmed by QCM experiments. The isothermal measurements with QCM showed that the sublimation activation energy of bulk TNT is 131 kJ/mol. More importantly, all results were obtained at one atmosphere and near room temperature. Thus, it should have direct impacts on explosive trace detection device applications.
机译:已经通过原子力显微镜和石英晶体微量天平(QCM)技术对来自本体表面和基底表面的2,4,6-三硝基甲苯(TNT)升华速率的研究进行了定量评估。提出了第一个原理理论模型,该模型允许获得三个关键参数,体升华率,表面相互作用势和有效衰变长度,而没有任意参数。通过QCM实验定量确定了模型预测的整体升华率。 QCM的等温测量表明,本体TNT的升华活化能为131 kJ / mol。更重要的是,所有结果都是在一个大气压和接近室温的条件下获得的。因此,它应该对爆炸痕量检测装置的应用产生直接影响。

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