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Homoepitaxial growth on nominally flat and stepped Cu(111) surfaces: island nucleation in fcc sites vs. hcp stacking fault sites

机译:在名义上平坦且阶梯状的Cu(111)表面上的同质外延生长:FCC站点与hcp堆垛层错站点中的岛形核

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We have investigated island nucleation in homoepitaxial growth on nominally flat and stepped (vicinal) Cu(1 1 1) surfaces using scanning tunneling microscopy. While on nominally flat Cu(1 1 1), Cu islands nucleate in fcc sites, island nucleation occurs rather in hcp stacking fault sites on stepped Cu(1 1 1) surfaces. We propose that strain on surfaces introduced by steps plays a significant role for the preferred sites. (C) 2003 Elsevier Science B.V. All rights reserved. [References: 36]
机译:我们使用扫描隧道显微镜研究了名义上平坦和阶梯状(邻近)的Cu(1 1 1)表面上同质外延生长中的岛形核。在名义上平坦的Cu(1 1 1)上,Cu岛在fcc部位成核,而在阶梯状Cu(1 1 1)表面上的hcp堆垛层错部位则发生岛状成核。我们提出,由台阶引入的表面应变对首选部位起着重要作用。 (C)2003 Elsevier Science B.V.保留所有权利。 [参考:36]

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