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Atomistic modeling of Ag deposition on the low-index faces of Al and Al deposition on Ag

机译:低折射率铝表面上的Ag沉积的原子建模和Ag上的Al沉积

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The deposition of Ag on low-index surfaces of Al, and the symmetric case of Al on Ag surfaces, are studied by means of a simple modeling approach based on a quantum approximate technique, the BFS method for alloys. For submonolayer deposits of Ag on Al, a preference is seen for growth of close-packed chains along nearest-neighbor directions on (100) and (110) surfaces, while cluster formation is preferred for growth on Al(111). For Al deposition on all three low-index Ag surfaces, diffusion of Al into the Ag surface layers is favored. The behavior seen on the various surfaces is attributed to a competition between the preference for Ag atoms to favor an Al environment, while Al atoms tend to avoid the increased energy associated with having Ag neighbors. The energies of the various atomic configurations are then determined by how the two competing effects manifest themselves for the corresponding geometric arrangements considered. (c) 2005 Elsevier B.V. All rights reserved.
机译:通过基于量子近似技术的简单建模方法(合金的BFS方法)研究了在低折射率Al表面上Ag的沉积以及Al在Ag表面上的对称情况。对于Ag在Al上的亚单层沉积,可以看到在(100)和(110)表面上沿最近邻方向紧密堆积的链生长,而在Al(111)上生长则更倾向于形成团簇。对于在所有三个低折射率Ag表面上的Al沉积,Al向Ag表面层中的扩散是有利的。在各个表面上看到的行为归因于优先选择Ag原子以支持Al环境之间的竞争,而Al原子倾向于避免与具有Ag邻居有关的能量增加。然后,通过两种竞争效应如何针对所考虑的相应几何排列表现出自身,确定各种原子构型的能量。 (c)2005 Elsevier B.V.保留所有权利。

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