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The adsorption of CCl_4 on Ag(111): Carbene and C=C bond formation

机译:CCl_4在Ag(111):碳上的吸附和C = C键的形成

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The adsorption of CCl_4 on Ag(111) has been investigated from 100 K to 300 K using absolute sticking probability measurement, temperature programmed desorption, Auger electron spectroscopy, low energy electron diffraction, ultra-violet photoelectron spectros-copy and X-ray photoelectron spectroscopy. At 100 K, CCl_4 adsorbs molecularly with a sticking probability of 1.0, forming a (3 x 3) adsorption structure. At 300 K the following overall reaction occurs, 2CCl_(4(g)) → 4Cl_((chem)) + C_2Cl_(4(g)), with an initial sticking probability of S_0 = 0.25, indicating that activated dissociative adsorption is the initial step in the above reaction. The saturated surface at 300 K consists entirely of chemisorbed chlorine which undergoes an order/disorder transition to a sharp (3~(1/2) x 3~(1/2)) R30° structure on cooling below 180 K. Temperature programmed desorption of CCLi adsorbed at 100 K shows a multilayer peak at 140 K and a first layer peak at 203 K, where part of the molecularly adsorbed CCl_4 desorbs and the rest is converted to a surface carbene, :CCl_2, and chemisorbed chlorine. At 248 K the adsorbed carbenes react to form C_2Cl_4 which promptly desorbs, as it is formed above its normal desorption temperature of 210 K.
机译:使用绝对粘附概率测量,程序升温解吸,俄歇电子能谱,低能电子衍射,紫外光电子能谱和X射线光电子能谱研究了从100 K到300 K的CCl_4在Ag(111)上的吸附。在100 K下,CCl_4以1.0的粘附概率进行分子吸附,形成(3 x 3)吸附结构。在300 K下发生以下总体反应,即2CCl_(4(g))→4Cl _((chem))+ C_2Cl_(4(g)),初始粘附概率为S_0 = 0.25,表明活化的离解吸附是初始进行上述反应。在300 K处的饱和表面完全由化学吸附的氯组成,当在180 K以下冷却时,氯会经历有序/无序转变为锐利的(3〜(1/2)x 3〜(1/2))R30°结构。在100 K处吸附的CCLi的峰数在140 K处显示多层峰,在203 K处显示第一层峰,其中部分分子吸附的CCl_4解吸,其余部分转化为表面卡宾:CCl_2和化学吸附的氯。在248 K时,吸附的碳烯反应生成C_2Cl_4,当它在210 K的正常解吸温度以上形成时,C_2Cl_4迅速解吸。

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