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GaAs(001) (2 × 4) to c(4 × 4) transformation observed in situ by STM during As flux irradiation

机译:STM在As通量辐照下原位观察到GaAs(001)(2×4)到c(4×4)的转变

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摘要

Atomic resolution scanning tunnelling microscopy (STM) has been used to study in situ the As-terminated reconstructions formed on GaAs(001) surfaces in the presence of an As_4 flux. The relationship between the As-rich (2 × 4) and c(4 × 4) surfaces is observed throughout the gradual evolution of the reconstruction transformation. The results suggest that during the initial stage of the transformation, Ga-rich As-terminated variations of the c(4 × 4) form in order to accommodate excess mobile Ga produced by pit formation. These transient structures later planarize, as excess Ga is incorporated at step/island edges. Successive imaging of the same sample area during As_4 irradiation allows point-by-point adatom binding to be analysed in a way inaccessible to MBE-STM systems relying on sample quenching and transfer.
机译:原子分辨率扫描隧道显微镜(STM)已用于在存在As_4助熔剂的情况下原位研究在GaAs(001)表面上形成的As末端重构物。在整个重构转换过程中,都观察到了富As(2×4)和c(4×4)表面之间的关系。结果表明,在转变的初始阶段,富集砷的c(4×4)端基形式发生了变化,以适应由凹坑形成而产生的过量移动砷。这些过渡结构随后平坦化,因为在台阶/岛边缘处引入了过量的Ga。在As_4辐照期间对相同样品区域进行连续成像,可以以依赖样品淬灭和转移的MBE-STM系统无法访问的方式来分析逐点吸附原子。

著录项

  • 来源
    《Surface Science》 |2009年第16期|2398-2402|共5页
  • 作者单位

    The University of Sheffield, Department of Electronic and Electrical Engineering, Mappin Street, Sheffield S1 3JD, UK;

    The University of Sheffield, Department of Electronic and Electrical Engineering, Mappin Street, Sheffield S1 3JD, UK;

    The University of Sheffield, Department of Electronic and Electrical Engineering, Mappin Street, Sheffield S1 3JD, UK;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    scanning tunnelling microscopy; molecular beam epitaxy; (2×4); c(4 × 4); in vivo; concurrent;

    机译:扫描隧道显微镜分子束外延(2×4);c(4×4);体内;同时;

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