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Development Of Electronic Structure Of Ni Thin Films On Cu(001) Surfaces

机译:Cu(001)表面Ni薄膜电子结构的发展

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We have traced the development of the Ni electronic structure with thickness variation on flat and nano-structured Cu(001) surfaces by means of photoemission spectroscopy. The binding energy of the Ni 2p_(3/2) main peak and satellite peak is found to have shifted monotonically in the direction opposite to each other, with the increase of Ni coverage. The reduced binding energy of the thin film's main peak is strongly correlated to the Cu 4s/Ni 3d interfacial hybridization effect (s/d 1HE) and the narrowing of the d band with the reduction of dimensions, while the increased satellite binding energy results from the combination of interface hybridization and expansion of an extended 4s-!ike state towards the vacuum. The center of the Ni d_(xy) band is predicted to shift closer to the Fermi level with increasing film thickness. Enhanced satellite intensity in thin films is observed, correlating to the narrowing of the d band with decreased film thickness. Through comparison of Ni films grown on flat versus nano-structured Cu(001) surfaces, the mixing of Cu and Ni atoms is found to be enhanced at the terrace edge region and consequently a larger s/d IHE is predicted for Ni on the nano-structured surface.
机译:我们已经通过光发射光谱法追踪了在平坦和纳米结构的Cu(001)表面上厚度变化的Ni电子结构的发展。随着Ni覆盖率的增加,发现Ni 2p_(3/2)主峰和卫星峰的结合能沿彼此相反的方向单调移动。薄膜主峰的结合能降低与Cu 4s / Ni 3d界面杂交效应(s / d 1HE)和d谱带随着尺寸减小而变窄密切相关,而卫星结合能的增加则源于界面杂交与扩展的4s-ike状态向真空的扩展相结合。预计Ni d_(xy)谱带的中心会随着膜厚度的增加而更接近费米能级。观察到薄膜中卫星强度的增强,这与d波段随着膜厚度的减小而变窄有关。通过比较在平坦表面与纳米结构的Cu(001)表面上生长的Ni膜,发现在平台边缘区域Cu和Ni原子的混合得到了增强,因此,预测纳米上Ni的s / d IHE更大结构化的表面。

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