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Electronic and magnetic structure of thin Ni films on Co/Cu(001)

机译:Co / Cu(001)上Ni薄膜的电子和磁性结构

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The electronic and magnetic structure of ferromagnetic Ni films grown epitaxially on ultrathin Films of Co has been studied by x-ray-absorption spectroscopy (XAS) using circular polarization. The growth morphology of the films was verified using high-resolution low-energy electron diffraction and indicated an incomplete layer-by-layer growth mode for the Co and Ni films deposited on Cu(001). We report the presence of additional peaks in the x-ray magnetic circular dichroism (XMCD) as predicted by the configuration interaction model. The ground-state magnetic moments were obtained from the XMCD sum rules at the Ni 2p edge. For a film thickness below 2 ML the number of holes and the spin polarization (spin moment per hole) show a gradual decrease, while the orbital polarization (orbital moment per hole) and the spin-orbit interaction show a gradual increase in magnitude. The 6-eV satellite structure, which is present in the XAS and XMCD of bulk Ni, disappears for submonolayer coverages while the dichroism due to "diffuse magnetism" between the L-3 and L-3 edges is strongly enhanced. These observations are ascribed to changes in the hybridization (electronic mu;mg) as a function of film thickness, which influences the ground-state d(8) weight and the s-state spin polarization. The strongly increased orbital moment per spin provides a good measure for the degree of localization. It is shown that for Ni thin firms a localization of the wave function does not lead to an enhancement in the total magnetic moment, but, on the contrary, its value is twice as small as the bulk value. [S0163-1829(99)0521 1-8]. [References: 43]
机译:通过使用圆偏振的X射线吸收光谱(XAS)研究了在Co的超薄膜上外延生长的铁磁Ni膜的电子和磁性结构。使用高分辨率低能电子衍射验证了薄膜的生长形态,并表明沉积在Cu(001)上的Co和Ni薄膜的逐层生长模式不完全。我们报告在X射线磁性圆二色性(XMCD)中存在额外的峰,如配置相互作用模型所预测。根据XMCD和规则,在Ni 2p边缘获得基态磁矩。对于小于2 ML的膜厚度,孔的数量和自旋极化(每个孔的自旋矩)会逐渐减小,而轨道极化(每个孔的旋转矩)和自旋轨道的相互作用会逐渐增大。存在于块状Ni的XAS和XMCD中的6 eV卫星结构在亚单层覆盖下消失,而L-3和L-3边缘之间的“扩散磁性”导致的二向色性得到了增强。这些观察结果归因于杂化的变化(电子μ; mg)随膜厚度的变化,这会影响基态d(8)的重量和s状态的自旋极化。每次自旋的轨道力矩大大增加,为定位度提供了一个很好的度量。结果表明,对于Ni薄公司,波动函数的局限性不会导致总磁矩的增强,相反,其值是体积值的两倍。 [S0163-1829(99)0521 1-8]。 [参考:43]

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