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Adsorption and desorption of fullerene on graphene/SiC(0001)

机译:富勒烯在石墨烯/ SiC(0001)上的吸附和解吸

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摘要

Adsorption and desorption of fullerene on a single layer of graphene grown on SiC(0001) were investigated by photoemission spectroscopy (PES). No significant change in the band structure of graphene was observed after fullerene deposition on the graphene layer under vacuum conditions, and subsequent exposure to the air. After annealing the fullerene layer at 275 ℃ in a vacuum, complete desorption of fullerene was observed without any resulting damage to the graphene structure. The desorption temperature of fullerene was significantly higher than that of pentacene, indicating that fullerene layers show higher stability than pentacene as protection layers of graphene-based devices.
机译:通过光发射光谱法(PES)研究了富勒烯在SiC(0001)上生长的单层石墨烯上的吸附和解吸。在富勒烯在真空条件下沉积在石墨烯层上并随后暴露于空气之后,未观察到石墨烯的能带结构发生显着变化。富勒烯层在真空中于275℃退火后,观察到富勒烯完全解吸,而没有对石墨烯结构造成任何损害。富勒烯的解吸温度显着高于并五苯,这表明作为基于石墨烯的器件的保护层,富勒烯层显示出比并五苯更高的稳定性。

著录项

  • 来源
    《Surface Science》 |2011年第8期|p.649-653|共5页
  • 作者单位

    Beamline Research Division, Pohang Accelerator Laboratory (PAL), Pohang University of Science and Technology (POSTECH), Pohang, 790-784, Republic of Korea;

    rnDepartment of Physics, Pohang University of Science and Technology (POSTECH), Pohang, 790-784, Republic of Korea;

    rnBeamline Research Division, Pohang Accelerator Laboratory (PAL), Pohang University of Science and Technology (POSTECH), Pohang, 790-784, Republic of Korea;

    rnDepartment of Chemistry, Sungkyunkwan University (SKKU), Suwon, 440-746, Republic of Korea;

    rnBeamline Research Division, Pohang Accelerator Laboratory (PAL), Pohang University of Science and Technology (POSTECH), Pohang, 790-784, Republic of Korea;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    protection layer; dirac point (E_D); graphene-based devices; synchrotron; photoemission spectroscopy (PES); angle resolved photoemission spectroscopy; (ARPES);

    机译:保护层;狄拉克点(E_D);基于石墨烯的器件;同步加速器光发射光谱法(PES);角分辨光发射光谱;(ARPES);

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