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Step-induced elastic relaxation and surface structure of the Si(7710) surface

机译:Si(7710)表面的阶跃诱发弹性弛豫和表面结构

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摘要

We have studied by Grazing Incidence X-ray Diffraction (GIXD) the strain field induced by periodic triple steps on a Si(7710) surface that is a vicinal of Si(111) surface 10° misoriented towards the [112] direction. We find that the strain field induced by the triple steps is well described by an elastic model in which the steps are modelized by parallel rows of buried elastic dipoles. The best fit of the experimental results is reached on the basis of the (7710) surface structure model proposed by Teys et al. (Surface Science 600 (2006) 4878). The so-obtained dipole characteristics are the dipole amplitude (decomposed in a stretch com ponent P_T = 1.5 nN and a torque component P_s=0.2 nN) as well as the lever arm Ω = 170° and force Φ = 81 ° orientations of the dipole. We also determine the prefactor of the elastic interaction energy between triple steps A_(el.) = 0.52 eV A we discuss in the light of other independent measurements.
机译:我们已经通过掠入射X射线衍射(GIXD)研究了周期性周期性三重台阶在Si(7710)表面上引起的应变场,该表面是向着[112]方向错位10°的Si(111)表面的附近。我们发现,由三重台阶引起的应变场可以通过弹性模型很好地描述,其中,台阶由埋入的弹性偶极子的平行行建模。实验结果的最佳拟合是根据Teys等人提出的(7710)表面结构模型得出的。 (Surface Science 600(2006)4878)。如此获得的偶极特性是偶极振幅(以拉伸分量P_T = 1.5 nN分解,扭矩分量P_s = 0.2 nN分解)以及杠杆臂Ω= 170°和力Φ= 81° 。我们还确定了我们根据其他独立测量讨论的三步A_(el。)= 0.52 eV A之间的弹性相互作用能的因子。

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  • 来源
    《Surface Science》 |2012年第4期|p.209-216|共8页
  • 作者单位

    Institut des Nanosciences de Paris, UMR CNRS 7588, Universite Pierre et Marie Curie-Paris 6,4 place Jussieu, Case 840, 75252 Paris, France;

    Centre lnterdisciplinaire de Nanoscience de Marseille, UPR3118, Aix-Marseille Universite, Campus de Luminy, Case 913, 13288 Marseille-Cedex, France;

    Institut des Nanosciences de Paris, UMR CNRS 7588, Universite Pierre et Marie Curie-Paris 6,4 place Jussieu, Case 840, 75252 Paris, France;

    Synchrotron SOLEIL, I'Orme des Merisiers, Saint-Aubin, BP 48,91192 Cifsur Yvette Cedex, France,Universite Paris Diderot, Sorbonne-Paris-Cite, MPQ, UMR 7162 CNRS, Batiment Condorcet, Case 7021, 75205 Paris Cedex 13, France;

    Synchrotron SOLEIL, I'Orme des Merisiers, Saint-Aubin, BP 48,91192 Cifsur Yvette Cedex, France;

    Centre lnterdisciplinaire de Nanoscience de Marseille, UPR3118, Aix-Marseille Universite, Campus de Luminy, Case 913, 13288 Marseille-Cedex, France;

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  • 原文格式 PDF
  • 正文语种 eng
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  • 关键词

    elastic relaxation; si vicinal surface; surface structure; grazing incidence X-ray diffraction; buried model; step-step interaction;

    机译:弹性松弛邻面表面结构掠入射X射线衍射埋模型逐步互动;

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