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A general phenomenological model for work function

机译:功函数的一般现象学模型

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摘要

A general phenomenological model is presented for obtaining the zero Kelvin work function of any crystal facet of metals and semiconductors, both clean and covered with a monolayer of electropositive atoms. It utilizes the known physical structure of the crystal and the Fermi energy of the two-dimensional electron gas assumed to form on the surface. A key parameter is the number of electrons donated to the surface electron gas per surface lattice site or adsorbed atom, which is taken to be an integer. Initially this is found by trial and later justified by examining the state of the valence electrons of the relevant atoms. In the case of adsorbed monolayers of electropositive atoms a satisfactory justification could not always be found, particularly for cesium, but a trial value always predicted work functions close to the experimental values. The model can also predict the variation of work function with temperature for clean crystal facets. The model is applied to various crystal faces of tungsten, aluminium, silver, and select metal oxides, and most demonstrate good fits compared to available experimental values.
机译:提出了一个通用的现象学模型,以获取金属和半导体的任何晶面的零开尔文功函数,这些晶面既干净又被单层正电原子覆盖。它利用了晶体的已知物理结构和假定在表面上形成的二维电子气的费米能。关键参数是每个表面晶格位点或吸附的原子给表面电子气的电子数量,取整数。最初是通过试验发现的,后来通过检查相关原子的价电子的状态来证明这一点。在吸附的正电原子单分子层的情况下,不能总是找到令人满意的理由,尤其是对于铯,但是试验值始终可以预测功函数接近实验值。该模型还可以预测干净晶面的功函数随温度的变化。该模型适用于钨,铝,银和精选的金属氧化物的各种晶面,与可用的实验值相比,大多数模型都具有很好的拟合度。

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