机译:衬底温度对射频技术制备的纳米ZnO薄膜结构,光学性能和介电性能的影响
Basic Science Department, Faculty of Industrial Education, Helwan University, Kobry El-Qppa, Cairo, Egypt;
Thin Film Laboratory, Physics Department, Faculty of Education, Ain Shams University, Roxy Square, 11757 Cairo, Egypt;
Solid State Physics Department, Physical Research Division, National Research Center (NRC), 12622 Dokki, Cairo, Egypt;
Nano-ZnO thin films; RF sputtering; Different substrate temperature; Structure; Optical properties; Effective mass; Dispersion energy and dielectric constants;
机译:衬底温度对高性价比化学喷雾热解法制备ZnO薄膜结构和光学性能的影响
机译:衬底温度和钴浓度对超声喷涂ZnO薄膜结构和光学性能的影响
机译:ZnO层和退火温度对射频磁控溅射制备的SiGe薄膜的结构,光学和膜-基底粘结性能的影响
机译:能量密度和衬底温度对脉冲激光沉积制备的CdSe薄膜结构和光学性能的影响
机译:金属有机化学气相沉积法制备钽酸钽铌酸钾薄膜的结构,介电和光学性质
机译:不同生长角度的射频磁控溅射ZnO薄膜的结构和光学性质
机译:通过射频技术制备的ZnO薄膜的非线性光谱光学性质,电敏感性和半导体依赖性研究