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Tuning the structural, electrical and optical properties of tin oxide thin films via cobalt doping and annealing

机译:通过钴掺杂和退火来调整氧化锡薄膜的结构,电学和光学性质

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摘要

Pure and cobalt-doped SnO_2 (Sn_(1-x)Co_xO_2, 0 ≤ x ≤ 0.09) thin films were grown by dissolving SnCl_2·2H_2O in ethanol and spin coating on glass substrates. The X-ray diffraction and Raman analysis show that the films are polycrystalline and correspond to the rutile phase with a preferred orientation along (110) direction. The grain size and crystallinity of the films that annealed at 450 ℃ for 1.0 h are enhanced after annealing at 500 ℃ for 2.0 h. According to atomic force microscopy (AFM), the films consist of grains influenced by doping and annealing temperature and time. Ⅰ-Ⅴ measurements reveal non-Ohmic contacts of the films with the electrodes. Transmittance spectra, optical band gap (E_g), Urbach energy (E_U), refractive index, film thickness, and the optical constants of the films are dependent on the Co content and annealing conditions. The obtained results illustrate the possibility of controlling the film's physical properties for the optoelectronic devices and applications.
机译:通过将SnCl_2·2H_2O溶解在乙醇中并旋涂在玻璃基板上,可以生长出纯的和掺钴的SnO_2(Sn_(1-x)Co_xO_2,0≤x≤0.09)薄膜。 X射线衍射和拉曼分析表明该膜是多晶的并且对应于金红石相,其具有沿(110)方向的优选取向。在500℃退火2.0 h后,450℃退火1.0 h薄膜的晶粒尺寸和结晶度增强。根据原子力显微镜(AFM),薄膜由受掺杂,退火温度和时间影响的晶粒组成。 Ⅰ-Ⅴ级测量表明膜与电极非欧姆接触。透射光谱,光学带隙(E_g),Urbach能量(E_U),折射率,膜厚和膜的光学常数取决于Co含量和退火条件。获得的结果说明了控制光电器件和应用的薄膜物理性能的可能性。

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