机译:后退火对组合热蒸发技术制备的CuSbS_2薄膜的结构,光学和电学性能的影响
Department of Physics, Faculty of Science, Universiti Teknologi Malaysia, UTM, Skudai, 81310 Johor, Malaysia;
Department of Physics, Faculty of Science, Universiti Teknologi Malaysia, UTM, Skudai, 81310 Johor, Malaysia;
Department of Physics, Faculty of Science, Universiti Teknologi Malaysia, UTM, Skudai, 81310 Johor, Malaysia;
Department of Physics, Faculty of Science, Universiti Teknologi Malaysia, UTM, Skudai, 81310 Johor, Malaysia;
Department of Physics, Faculty of Science, Universiti Teknologi Malaysia, UTM, Skudai, 81310 Johor, Malaysia;
Department of Physics, Faculty of Science, Universiti Teknologi Malaysia, UTM, Skudai, 81310 Johor, Malaysia;
Laboratoire de Physique Quantique et de Modelisation Mathematique (LPQ3M), Departement de Technologie, Universite de Mascara, 29000, Algeria;
School of Computer Science & Engineering, Faculty of Engineering, SMVD University, Kakryal, Katra, 182320 J&K, India;
Material Science Research Laboratory, Department of Physics, S. V. College, Aligarh, 202001 U.P., India;
CuSbS_2; Thin films; Optical properties; Combinatorial deposition; Electrical properties; Photovoltaic applications;
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机译:退火对热蒸发技术制备的ZnO薄膜结构,电学和光学性质的影响