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Theoretical study of the influence of strain and polarization on performance of AlGaN/4H-SiC HBT

机译:应变和极化对AlGaN / 4H-SiC HBT性能影响的理论研究

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The n~+-AlGaN/p~+-4H-SiC-4H-SiC HBT structure possesses large interfacial polarization charges as well as bulk and interfacial defects. Considerable leakage currents have thus far prevented significant development of this device. The piezoelectric polarization charge can be controlled by modifying the strain in the structure and can in fact negate the spontaneous charge for an Al_(0.3)Ga_(0.7)N layer on 4H-SiC. Although large-area AlGaN films are relaxed above a critical thickness, nano-heteroepitaxy theory predicts that AlGaN columns can be coherently grown on sub-micron oxide openings. The electrical characteristics were calculated for HBTs with strained and relaxed (Al)GaN emitter layers.
机译:n〜+ -AlGaN / p〜+ -4H-SiC / n-4H-SiC HBT结构具有较大的界面极化电荷以及体积和界面缺陷。迄今为止,相当大的泄漏电流阻止了该装置的显着发展。压电极化电荷可以通过改变结构中的应变来控制,并且实际上可以抵消4H-SiC上Al_(0.3)Ga_(0.7)N层的自发电荷。尽管大面积的AlGaN膜在临界厚度以上松弛,但纳米异质外延理论预测AlGaN柱可以在亚微米氧化物开口上相干生长。计算具有应变和松弛(Al)GaN发射极层的HBT的电特性。

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