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Physical limitations of the diffusive approximation in semiconductor device modeling

机译:半导体器件建模中扩散近似的物理局限性

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Criteria for occurrence of the quasineutral diffusion mode have been investigated in terms of a generalized approach that takes into account the dependences of the electron and hole velocities on the electric field. These criteria should be used to describe the carrier transport in bases of forward biased bipolar semiconductor devices (diodes, thyristors, and power bipolar transistors in the saturation mode). The criteria appreciably differ from the previously obtained commonly accepted criteria. It is demonstrated that equations describing the carrier transport in the quasineutral approximation in n- and p-type semiconductors are different. These equations are used to obtain analytical conditions in which the diffusion mode is operative. The applicability limits of the diffusion approximation in simulation of semiconductor structures are found. The analytical results are confirmed by a numerical experiment.
机译:已经根据一种通用方法研究了准中性扩散模式的发生标准,该方法考虑了电子和空穴速度对电场的依赖性。这些标准应用于描述正向偏置双极半导体器件(饱和模式下的二极管,晶闸管和功率双极晶体管)的基极中的载流子传输。该标准明显不同于先前获得的普遍接受的标准。结果表明,在n型和p型半导体的准中性近似中描述载流子输运的方程式是不同的。这些方程式用于获得扩散模式有效的分析条件。发现了扩散近似在半导体结构仿真中的适用范围。数值实验证实了分析结果。

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