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Internal voltage generator for low voltage, quarter-micrometer flash memories

机译:内部电压发生器,用于低电压,四分之一微米的闪存

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A fabricated bandgap generator using 0.25-/spl mu/m Flash memory process generated a stable reference voltage under 4 V, boosted from an external power supply of 2.5 V. The generated voltage was 1.297/spl plusmn/0.025 V at a power supply of 4 V/spl plusmn/10%; the temperature dependence was +0.7 mV//spl deg/C. The characteristics of a triple-well bipolar transistor for the Flash memory process are sufficient for a reference voltage generator; f/sub T/ is 230 MHz, and H/sub FE/ is 70. Dynamic operation reduced the average current consumption from 306 to 8.6 /spl mu/A. Fabricated voltage-doubler circuits generated a voltage 1.8 times larger than that from conventional charge-pump circuits.
机译:使用0.25- / spl mu / m闪存工艺制造的带隙发生器,通过2.5 V外部电源升压,可在4 V以下产生稳定的参考电压。在2.5 V的电源下,产生的电压为1.297 / spl plusmn / 0.025V。 4 V / spl最高/ 10%;温度依赖性为+0.7 mV // spl deg / C。用于闪存过程的三阱双极晶体管的特性足以用作参考电压发生器; f / sub T /为230 MHz,H / sub FE /为70。动态工作将平均电流消耗从306降低至8.6 / spl mu / A。预制的倍压电路产生的电压是传统电荷泵电路的1.8倍。

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