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首页> 外文期刊>IEEE Journal of Solid-State Circuits >A 455-Mb/s MR preamplifier design in a 0.8-Μm CMOS process
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A 455-Mb/s MR preamplifier design in a 0.8-Μm CMOS process

机译:采用0.8Mm CMOS工艺的455Mb / s MR前置放大器设计

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In this paper, we present a CMOS preamplifier for use withnmagnetoresistive (MR) read elements in disk drives. The performance ofnthe CMOS design is competitive with the more expensive currentngeneration of BiCMOS MR preamplifiers. The measured gain for thenpreamplifier is 43 dB and the measured 3-dB bandwidth is greater thann273 MHz corresponding to a 455-Mb/s data rate. Likewise, the measuredninput-referred voltage noise is less than 0.57 nV/√Hz, andnmeasured input-referred current noise is less than 10.54 pA/√Hz atnan MR bias current of 10 mA, The preamplifier has been implemented in an0.8-Μm 5 V CMOS process and occupies a die area of 1.78×1.78 mmn2 In this paper, we introduce a new scheme to reduce currentnnoise below that contributed by a single MOS device, This technique hasnthe potential for even more impact for future submicron processes. Wenalso showed that voltage amplifiers offer lower noise thanntransimpedance amplifiers for similar gain and bandwidth constraints
机译:在本文中,我们介绍了一种用于磁盘驱动器中的磁阻(MR)读取元件的CMOS前置放大器。 CMOS设计的性能与价格昂贵的BiCMOS MR前置放大器相比具有竞争力。前置放大器的测得增益为43 dB,测得的3 dB带宽大于n273 MHz,对应于455-Mb / s的数据速率。同样,在10 mA的MR偏置电流下,测得的输入参考电压噪声小于0.57 nV /√Hz,测得的输入参考电流噪声小于10.54 pA /√Hz,前置放大器已实现为0.8μm 5 V CMOS工艺并占用了1.78×1.78 mmn2的管芯面积。在本文中,我们介绍了一种将电流噪声降低到单个MOS器件所产生的噪声以下的新方案,该技术没有潜力对未来的亚微米工艺产生更大的影响。 Wen还表明,在相似的增益和带宽限制下,电压放大器比跨阻放大器提供更低的噪声

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