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Exponential curvature-compensated BiCMOS bandgap references

机译:指数曲率补偿BiCMOS带隙基准

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摘要

An exponential curvature compensation technique for bandgap references (BGR's) which exploits the temperature characteristics of the current gain /spl beta/ of a bipolar transistor is described. This technique requires no additional circuits for the curvature compensation; only a size adjustment of a bias transistor in a conventional first-order compensated BGR is required. Positive and negative versions of the exponential curvature-compensated BGR have been fabricated using a 1.5 /spl mu/m BiCMOS process. Average temperature coefficients (TC's) of the negative BGR are measured as 2.4 and 6.7 ppm//spl deg/C, and those of the positive BGR are measured as 3.5 and 8.9 ppm//spl deg/C over the commercial (0/spl sim/70/spl deg/C) and military (-55/spl sim/125/spl deg/C) temperature ranges, respectively. These circuits dissipate 0.37 mW with a single 5 V supply, and occupy 270/spl times/150 /spl mu/m/sup 2/ and 290/spl times/150 /spl mu/m/sup 2/, respectively.
机译:描述了一种用于带隙基准(BGR)的指数曲率补偿技术,该技术利用了双极晶体管的电流增益/ spl beta /的温度特性。这种技术不需要额外的电路来进行曲率补偿。仅需要常规的一阶补偿BGR中的偏置晶体管的尺寸调整。指数曲率补偿BGR的正负版本已使用1.5 / spl mu / m BiCMOS工艺制造。相对于商用(0 / spl),负BGR的平均温度系数(TC)的测量值为2.4和6.7 ppm // spl deg / C,正BGR的平均温度系数的测量值为3.5和8.9 ppm // spl deg / C sim / 70 / spl deg / C)和军用(-55 / spl sim / 125 / spl deg / C)温度范围。这些电路在5 V单电源下的功耗为0.37 mW,分别占据270 / spl次/ 150 / spl mu / m / sup 2 /和290 / spl次/ 150 / spl mu / m / sup 2 /。

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