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Development of a new thin film composition for SnS solar cell

机译:开发用于SnS太阳能电池的新型薄膜组合物

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摘要

The work is devoted to the development of a new thin film composition for SnS solar cell based on semiconductor heterojunction n-Zn (O,S)/p-SnS by the combination of two low-cost liquid methods, namely electrodeposition and Successive Ionic Layer Adsorption and Reaction (SILAR). Structure and optical properties of the obtained layers have been investigated. The p-SnS absorber is fabricated by combining the two methods. The creation of the main SnS film was carried out by sulfurization of the electrodeposited Sn thin film. The elimination of the shunt leakage was made by SILAR deposition of nanocrystalline SnS into pores of the main SnS. All SnS films are single-phase and consisted of tin monosulfide with orthorhombic structure of Herzenbergite. Wide band gap and transparent buffer layer n-Zn(O,S) is created by air annealing of ZnS thin film prepared by SILAR. Series and shunt resistances as well as a height of the rectifying barrier of this n-Zn(O,S)/p-SnS heterostructure were investigated due dark current voltage characteristics. The diode and electronic parameters of this new thin film composition is superior ones for the obtained by using tin sulfide absorber produced only by SILAR. (c) 2016 Elsevier Ltd. All rights reserved.
机译:该工作致力于通过两种低成本液体方法(电沉积和连续离子层)的组合,开发基于半导体异质结n-Zn(O,S)/ p-SnS的SnS太阳能电池新薄膜组合物吸附和反应(SILAR)。已经研究了获得的层的结构和光学性质。通过结合两种方法来制造p-SnS吸收剂。通过电沉积的Sn薄膜的硫化进行SnS主膜的制作。通过SILAR将纳米晶SnS沉积到主要SnS的孔中,可以消除并联泄漏。所有的SnS薄膜均为单相,由具有Herzenbergite斜方晶结构的单硫化锡组成。宽带隙和透明缓冲层n-Zn(O,S)是通过对SILAR制备的ZnS薄膜进行空气退火而形成的。由于暗电流电压特性,研究了该n-Zn(O,S)/ p-SnS异质结构的串联电阻和分流电阻以及整流势垒的高度。对于仅使用SILAR生产的硫化锡吸收剂而言,这种新型薄膜组合物的二极管和电子参数优越。 (c)2016 Elsevier Ltd.保留所有权利。

著录项

  • 来源
    《Solar Energy》 |2016年第9期|156-164|共9页
  • 作者单位

    Natl Tech Univ, Kharkiv Polytech Inst, 21 Bahalii Str, UA-61000 Kharkov, Ukraine;

    Natl Tech Univ, Kharkiv Polytech Inst, 21 Bahalii Str, UA-61000 Kharkov, Ukraine;

    Natl Tech Univ, Kharkiv Polytech Inst, 21 Bahalii Str, UA-61000 Kharkov, Ukraine;

    All Russian Res Inst Electrificat Agr VIESH, 2,1 St Veschnyakovsky Psg, Moscow 109456, Russia;

    Kharkiv Aviat Inst Natl Aerosp Univ, 17 Chkalov St, UA-61070 Kharkov, Ukraine;

    Natl Tech Univ, Kharkiv Polytech Inst, 21 Bahalii Str, UA-61000 Kharkov, Ukraine;

    Natl Tech Univ, Kharkiv Polytech Inst, 21 Bahalii Str, UA-61000 Kharkov, Ukraine;

    Natl Tech Univ, Kharkiv Polytech Inst, 21 Bahalii Str, UA-61000 Kharkov, Ukraine;

    Natl Tech Univ, Kharkiv Polytech Inst, 21 Bahalii Str, UA-61000 Kharkov, Ukraine;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Tin sulfide; SILAR; Electrodeposition; Photovoltaics; Heterostructure;

    机译:硫化锡;SILAR;电沉积;光伏;异质结构;

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