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Isotropic Piezoresistance in Polycrystalline Silicon for In-plane Shear- and Normal-Stress Gauges

机译:面内剪切和正常应力测量仪的多晶硅的各向同性压阻

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摘要

In this study, an isotropic piezoresistance equation for polycrystalline silicon(poly-Si), focusing particularly on shear piezoresistance in p-type poly-Si, is derived. The total number of independent piezoresistance coefficients to describe the isotropic piezoresistance effect of poly-Si is found to be two. It is also found that, for an isotropic poly-Si-Hall-type piezoresistor, the change in resistance is induced only by normal stresses while the change in transverse voltage is induced only by shear stresses.
机译:在这项研究中,推导了多晶硅(poly-Si)的各向同性压阻方程,特别关注p型多晶硅中的剪切压阻。发现描述多晶硅的各向同性压阻效应的独立压阻系数总数为2。还发现,对于各向同性的多晶硅-霍尔型压敏电阻,电阻的变化仅由正应力引起,而横向电压的变化仅由剪切应力引起。

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