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Modeling and Simulation of a Single Tin Dioxide Nanobelt FET for Chemical Sensors

机译:用于化学传感器的单个二氧化锡纳米带FET的建模和仿真

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This paper presents the modeling and simulation of a tin dioxide (SnO2) field-effect transistor (FET)-based nanobelt gas sensor. The model results are compared to numerical simulations and experimental data obtained from published results describing the fabrication of single crystal nanobelts grown through thermal evaporation techniques. The fabricated sensor shows good response when exposed to oxygen (O2) and hydrogen (H2) at room temperature. Gas adsorption causes changes in the electrical contacts due to oxygen vacancies in the bulk. As a result, the I-V characteristics are very different when the device is exposed to (O2) versus (H2). In the presence of H2, the behavior of the contacts is ohmic and saturation is caused by pinch-off of the channel at the drain contact. However, in the presence of O2, the behavior of the contacts is Schottky, and device saturation occurs at the source end of the device. Our model is based on a depletion mode MOSFET and it accounts for both ohmic and Schottky contacts when the device is exposed to oxygen or hydrogen. It also provides a possible explanation for the gate bias dependence of the saturation current seen in some published characterization data.
机译:本文介绍了基于二氧化锡(SnO2)场效应晶体管(FET)的纳米带气体传感器的建模和仿真。将模型结果与数值模拟和实验数据进行比较,这些数据和实验数据来自已发表的结果,这些结果描述了通过热蒸发技术生长的单晶纳米带的制备。当在室温下暴露于氧气(O2)和氢气(H2)时,制成的传感器显示出良好的响应。气体吸附会由于主体中的氧空位而导致电触点发生变化。结果,器件暴露于(O2)与(H2)时的I-V特性非常不同。在存在H 2的情况下,触点的行为是欧姆性的,并且饱和是由漏极触点处的沟道收缩引起的。但是,在存在氧气的情况下,触点的行为是肖特基,并且器件饱和发生在器件的源端。我们的模型基于耗尽型MOSFET,它说明了当器件暴露于氧气或氢气时的欧姆接触和肖特基接触。它还提供了对某些公开的特性数据中看到的饱和电流的栅极偏置依赖性的可能解释。

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