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首页> 外文期刊>Sensors and Actuators >Comparison of Y-doped Bazro_3 thin films for high temperature humidity sensors by RF sputtering and pulsed laser deposition
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Comparison of Y-doped Bazro_3 thin films for high temperature humidity sensors by RF sputtering and pulsed laser deposition

机译:射频溅射和脉冲激光沉积用于高温湿度传感器的Y掺杂Bazro_3薄膜的比较

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摘要

This paper presents a comprehensive comparison of the fabrication processing parameters and the electrical, mechanical, chemical, and sensing properties of sputtered and pulsed laser deposited (PLD) Y-doped BaZrO_3 thin films for the use in high temperature (400-650℃) water vapor partial pressure measurements.rnRF sputtered thin films with thicknesses of between 200 and 750 nm, at pressures between 0.45 and 50 mTorr and deposition powers between 50 and 300 W were deposited and annealed at 800℃ or 1000℃ for 3 h in air. Correlations between mechanical film stress, X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), and atomic force microscopy (AFM) stoichiometry data, crystallographic, surface morphology and process and film parameters are presented. Furthermore, the baseline resistivity was characterized as function of film thickness and temperature.rnPLD samples with thicknesses between 200 and 500 nm were deposited at room temperature to 800℃. All samples were characterized as deposited. 200 and 500 nm thick samples were also annealed at 1000℃ for 3 h in air and characterized post-anneal. The Ba concentration vs. substrate temperature remained stable within 12-16%, correlating with those Ba concentrations that yield good sensitivity (0.25-8 atm~(-1)). The low dependence of the Ba concentration on the deposition parameters indicates that the PLD deposition process allows larger process windows for the deposition of good sensitivity thin film material compared to sputtering.rnWater vapor partial pressure sensitivity indicated a decrease in sensitivity with decrease in Ba concentration in the films. Partial transition of the Y-doped BaZrO_3 to ZrO_2 and subsequent decrease in oxygen vacancy sites could explain the loss in sensitivity. PLD samples were on average more stable and repeat-able and less process dependent, but had lower sensitivity towards humidity. This could be explained by the higher, more stoichiometric and less process dependent Ba concentration of these samples compared to the sputtered samples. At high temperatures (>550℃) only the PLD samples exhibit stable sensitivity towards humidity.rnThe resulting activation energies for the sputtered samples are only slightly larger than those of the PLD samples at lower temperatures (hole conduction) and much larger at high temperatures (oxygen ion conduction). Annealing of the PLD samples at 1000℃ increases the sensor response time by 10 times and the relaxation time by a factor of 8. Sputtered samples do not survive annealing at 1000℃. PLD samples also by far outlast sputtered samples in terms of lifetime.
机译:本文对用于高温(400-650℃)水的溅射和脉冲激光沉积(YD)掺杂的Y掺杂BaZrO_3薄膜的制造工艺参数以及电学,机械,化学和感测性能进行了全面比较。 rnRF溅射的薄膜厚度为200至750 nm,压力为0.45至50 mTorr,沉积功率为50至300 W,在空气中于800℃或1000℃退火3 h。介绍了机械薄膜应力,X射线光电子能谱(XPS),X射线衍射(XRD)和原子力显微镜(AFM)化学计量数据,晶体学,表面形态以及工艺和薄膜参数之间的相关性。此外,将基线电阻率表征为膜厚度和温度的函数。在室温至800℃下沉积厚度为200至500nm的rnPLD样品。所有样品均表征为沉积。还将200和500 nm厚的样品在空气中于1000℃退火3 h,并进行后退火。钡的浓度相对于底物温度保持稳定在12-16%之间,与产生良好灵敏度(0.25-8 atm〜(-1))的那些钡浓度相关。 Ba浓度对沉积参数的低依赖性表明,与溅射相比,PLD沉积工艺允许更大的工艺窗口沉积具有良好敏感性的薄膜材料.rn水蒸气分压敏感性表明,随着Ba浓度的降低,敏感性降低。电影。掺Y的BaZrO_3部分过渡到ZrO_2以及随后氧空位的减少可能解释了灵敏度的降低。 PLD样本平均而言更稳定,可重复且对过程的依赖性较小,但对湿度的敏感性较低。与溅射的样品相比,这些样品的Ba浓度更高,化学计量更高且与过程相关的Ba浓度较低,可以解释这一点。在高温(> 550℃)下,只有PLD样品对湿度表现出稳定的敏感性。rn溅射样品的活化能仅略高于PLD样品在较低温度(空穴传导)时的活化能,而在高温下则更大(氧离子传导)。 PLD样品在1000℃下退火会使传感器响应时间增加10倍,弛豫时间增加8倍。溅射的样品在1000℃下不能经受退火。就寿命而言,PLD样品的寿命也远胜于溅射样品。

著录项

  • 来源
    《Sensors and Actuators》 |2010年第1期|P.173-180|共8页
  • 作者单位

    Department of Electrical Engineering, University of Utah, Salt Lake City, UT, USA;

    rnDepartment of Electrical Engineering, University of Utah, Salt Lake City, UT, USA;

    rnDepartment of Electrical Engineering, University of Utah, Salt Lake City, UT, USA;

    rnDepartment of Electrical Engineering, University of Utah, Salt Lake City, UT, USA Department of Material Sciences and Engineering, University of Utah, Salt Lake City, UT, USA Department of Bioengineering, University of Utah, Salt Lake City, UT, USA;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    thin film; humidity; high temperature; Y-doped BaZrO_3; sputtering; PLD;

    机译:薄膜;湿度;高温;Y掺杂的BaZrO_3;溅射可编程逻辑器件;

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