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首页> 外文期刊>Sensors and Actuators >Electrical characterization of high performance, liquid gated vertically stacked SiNW-based 3D FET biosensors
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Electrical characterization of high performance, liquid gated vertically stacked SiNW-based 3D FET biosensors

机译:高性能,液控垂直堆叠的基于SiNW的3D FET生物传感器的电气特性

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摘要

A 3D vertically stacked silicon nanowire (SiNW) field effect transistor featuring a high density array of fully depleted channels gated by a backgate and one or two symmetrical platinum side-gates through a liquid has been electrically characterized for their implementation into a robust biosensing system. The structures have also been characterized electrically under vacuum when completely surrounded by a thick oxide layer. When fully suspended, the SiNWs may be surrounded by a conformal high-κ gate dielectric (HfO_2) or silicon dioxide. The high density array of nanowires (up to 7 or 8 × 20 SiNWs in the vertical and horizontal direction, respectively) provides for high drive currents (1.3 mA/μm, normalized to an average NW diameter of 30 nm at V_(SG)=- 3 V, and V_d= 50 mV, for a standard structure with 7 × 10 NWs stacked) and high chances of biomolecule interaction and detection. The use of silicon on insulator substrates with a low doped device layer significantly reduces leakage currents for excellent I_(on)/I_(off) ratios >10~6 of particular importance for low power applications. When the nanowires are submerged in a liquid, they feature a gate all around architecture with improved electrostatics that provides steep subthreshold slopes (SS < 75 mV/dec), low drain induced barrier lowering (DIBL < 20 mV/V) and high transconductances (gm > 10 μS) while allowing for the entire surface area of the nanowire to be available for biomolecule sensing. The fabricated devices have small SiNW diameters (down to d_(NW)~ 15-30 nm) in order to be fully depleted and provide also high surface to volume ratios for high sensitivities.
机译:一种3D垂直堆叠的硅纳米线(SiNW)场效应晶体管,具有高密度的完全耗尽型沟道阵列,该沟道由背栅和一个或两个对称的铂侧栅通过液体进行选通,其电特性已被表征为可实现到强大的生物传感系统中。当被厚的氧化物层完全包围时,该结构在真空下也具有电学特征。当完全悬浮时,SiNW可能被保形的高k栅极电介质(HfO_2)或二氧化硅包围。纳米线的高密度阵列(分别在垂直和水平方向上最多7或8×20 SiNWs)提供高驱动电流(1.3 mA /μm,在V_(SG)=时归一化为30 nm的平均NW直径) -3 V,V_d = 50 mV(对于堆叠有7×10 NW的标准结构),并且生物分子相互作用和检测的机会很高。在具有低掺杂器件层的绝缘体衬底上使用硅可以显着降低泄漏电流,因为I_(on)/ I_(off)比率​​极佳(> 10〜6),这对于低功率应用而言尤其重要。当纳米线浸没在液体中时,它们的特点是整个结构的门具有改善的静电性能,可提供陡峭的亚阈值斜率(SS <75 mV / dec),低漏极感应势垒降低(DIBL <20 mV / V)和高跨导( gm> 10μS),同时允许将纳米线的整个表面积用于生物分子传感。所制造的器件具有较小的SiNW直径(小至d_(NW)〜15-30 nm),以便被完全耗尽,并且还提供高的表面体积比以实现高灵敏度。

著录项

  • 来源
    《Sensors and Actuators》 |2014年第8期|291-300|共10页
  • 作者单位

    Nanoelectronic Devices Laboratory (Nanolab), Ecole Polytechnique federal de Lausanne (EPFL), 1015 Lausanne, Switzerland;

    Nanoelectronic Devices Laboratory (Nanolab), Ecole Polytechnique federal de Lausanne (EPFL), 1015 Lausanne, Switzerland,IBM Research - Zurich, Saeumerstrasse 4, CH-8803 Rueschlikon, Switzerland;

    Materials Chemistry and Analysis Group, Department of Chemistry and Tyniall National Institute, University College Cork, Lee Maltings, Dyke Parade, Cork, Ireland;

    Materials Chemistry and Analysis Group, Department of Chemistry and Tyniall National Institute, University College Cork, Lee Maltings, Dyke Parade, Cork, Ireland;

    Materials Chemistry and Analysis Group, Department of Chemistry and Tyniall National Institute, University College Cork, Lee Maltings, Dyke Parade, Cork, Ireland;

    Materials Chemistry and Analysis Group, Department of Chemistry and Tyniall National Institute, University College Cork, Lee Maltings, Dyke Parade, Cork, Ireland;

    Imperial College London, South Kensington, London SW7 2AZ, UK;

    Nanoelectronic Devices Laboratory (Nanolab), Ecole Polytechnique federal de Lausanne (EPFL), 1015 Lausanne, Switzerland;

    Nanoelectronic Devices Laboratory (Nanolab), Ecole Polytechnique federal de Lausanne (EPFL), 1015 Lausanne, Switzerland;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    ISFET; Sensor; FinFET; SiNW; GAA; Ion sensitive field effect transistor;

    机译:ISFET;传感器;FinFET;SiNW;GAA;离子敏感场效应晶体管;

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