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Sensitivity of solutions of Poisson's equation to boundary values in p-type a-Si:H thin films

机译:p型a-Si:H薄膜中泊松方程解对边界值的敏感性

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The sensitivity of the separation of the bottom edge of the conduction band and the Fermi level, E_c - E_F, in a p-type and intrinsic 5 Um thick a-Si:H layer, to the boundary values required for a solution to Poisson's equation has been investigated computationally. The bandgap of the a-Si:H is 1.89 eV and the boundary values considered vary from E_c - E_F = 0 to 1.89 eV These are extreme values; realistic values would lie within this range, but using such extreme values allows us to infer the sensitivity of the solution to all realistic boundary values. It was found that E_c - E_F near the surfaces is sensitive to the boundary values, but E_c - E_F in the interior of the layer is insensitive to the boundary values. The region of sensitivity is narrow for high boron dopant concentrations (1.12 × 10~19 cm~-3), and increases as the dopant concentration is decreased. For an intrinsic layer l Um thick, E_c - E_F exhibits sensitivity to the boundary values throughout the layer.
机译:在p型和本征5 Um厚的a-Si:H层中,导带底部边缘和费米能级E_c-E_F的间隔对解泊松方程所需的边界值的敏感性已经进行了计算研究。 a-Si:H的带隙为1.89 eV,所考虑的边界值在E_c-E_F = 0至1.89 eV之间变化。实际值将在此范围内,但是使用这样的极值可以让我们推断解决方案对所有实际边界值的敏感性。发现在表面附近的E_c-E_F对边界值敏感,但是在层内部的E_c-E_F对边界值不敏感。对于高浓度的硼掺杂剂(1.12×10〜19 cm〜-3),灵敏度区域较窄,并且随着掺杂剂浓度的降低而增加。对于1μm厚的本征层,E_c-E_F对整个层的边界值表现出敏感性。

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