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Analysis of the turn-on process in 6 kV 4H-SiC junction diodes

机译:6 kV 4H-SiC结二极管的导通过程分析

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The switch-on process in 6 kV 4H-SiC junction diodes has been investigated experimentally and theoretically. The results of a detailed computer simulation are compared with the data furnished by the analytical theory. It is demonstrated that, at high current densities exceeding the critical value j(cr) = eN(D)v(s) (e is the elementary charge, N-D is the base doping level, and v(s) is the carrier saturation velocity) and rather short current rise time (1 ns), an extremely fast base modulation can be achieved. In this mode, the base is spanned by an electron front that moves from the n(+)-n to the p(+)-n emitter with a velocity v(s) and by a relatively slow quasi-neutral hole front moving in the opposite direction, from the p(+)-n to the n(+)-n junction.
机译:对6 kV 4H-SiC结二极管的接通过程进行了实验和理论研究。将详细的计算机仿真结果与分析理论提供的数据进行比较。结果表明,在高电流密度下,超过临界值j(cr)= eN(D)v(s)(e为基本电荷,ND为基础掺杂水平,v(s)为载流子饱和速度)和相当短的电流上升时间(1 ns),可以实现极快的基本调制。在这种模式下,基极被一个以速度v(s)从n(+)-n发射到p(+)-n发射极的电子前沿和一个相对缓慢的准中性空穴前沿跨越。从p(+)-n到n(+)-n结的方向相反。

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