首页> 外文期刊>Semiconductor science and technology >Porous GaN/SiC templates for homoepitaxial growth: effect of the built-in stress on the formation of porous structures
【24h】

Porous GaN/SiC templates for homoepitaxial growth: effect of the built-in stress on the formation of porous structures

机译:同质外延生长的多孔GaN / SiC模板:内置应力对多孔结构形成的影响

获取原文
获取原文并翻译 | 示例
       

摘要

Formation of porous structures in GaN/SiC heterostructures in light of the need for porous templates for improved GaN epitaxial growth has been studied. It has been observed that the built-in stress in the heterostructures greatly affects the process of porous structure formation. As a result, it is shown that two major issues are necessary to consider when fabricating a porous GaN/SiC template: firstly, the initial heterostructures must be selected according to the built-in stress value, and secondly, anodization parameters necessary to achieve a homogeneous porous structure must be used. Having considered these, we achieved 30% stress reduction in 2" GaN/SiC templates. Improvements of GaN growth result from employing porous templates and have been shown to depend on growth conditions.
机译:根据对改善GaN外延生长的多孔模板的需求,已经研究了在GaN / SiC异质结构中形成多孔结构。已经观察到,异质结构中的内在应力极大地影响了多孔结构的形成过程。结果表明,在制造多孔GaN / SiC模板时需要考虑两个主要问题:首先,必须根据内置应力值选择初始异质结构,其次,为获得理想的阳极氧化参数必须使用均质的多孔结构。考虑了这些因素,我们在2“ GaN / SiC模板中实现了30%的应力降低。采用多孔模板可提高GaN生长,并且已证明其取决于生长条件。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号