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Enhancing the current gain in InP/InGaAs double heterojunction bipolar transistors using emitter edge thinning

机译:使用发射极边缘稀化增强InP / InGaAs双异质结双极晶体管的电流增益

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摘要

This paper reports InP/InGaAs double heterojunction bipolar transistors (DHBTs) made with composite-collector designs. The current gains of the DHBTs without and with emitter edge-thinning designs are 125 and 180, respectively. The composition of the collector and the base currents is analysed from the Gummel plots. Experimental data demonstrate that emitter edge thinning can further reduce the surface recombination current of the InP/InGaAs DHBTs and thus dramatically improve current gain, even though the surface recombination in InP/InGaAs DHBTs is much less than in GaAs-based DHBTs.
机译:本文报道了采用复合集电极设计的InP / InGaAs双异质结双极晶体管(DHBT)。没有和有发射极边缘稀疏设计的DHBT的电流增益分别为125和180。集电极的组成和基极电流可通过Gummel图进行分析。实验数据表明,即使InP / InGaAs DHBT中的表面重组比基于GaAs的DHBT中的重组要少得多,发射极边缘变薄还可以进一步降低InP / InGaAs DHBT的表面重组电流,从而显着提高电流增益。

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