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Effects of the intrinsic layer width on the band-to-band tunneling current in p-i-n GaN-based avalanche photodiodes

机译:本征层宽度对基于p-i-n GaN的雪崩光电二极管中的带间隧穿电流的影响

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摘要

Dark current is critical for GaN-based avalanche photodiodes because it significantly increases the noise current and limits the multiplication factor. It has been found that the band-to-band tunneling current is the dominant origin of the dark current for avalanche photodiodes at the onset of breakdown voltage. Experimentally, for GaN-based avalanche photodiodes with a thinner intrinsic layer, the dark current increases nearly exponentially with the applied voltage even at a lower bias voltage. In this paper, the intrinsic layer (i-layer) width of GaN-based avalanche photodiodes has been varied to study its effect on the band-to-band tunneling current. A widely used equation was used to calculate the band-to-band tunneling current of avalanche photodiodes with different i-layer widths (i-layer 0.1 μm, 0.2 μm and 0.4 μm). At -40 V, the band-to-band tunneling current significantly reduces by a magnitude of 10~(-15) A with an increase in the i-layer width from 0.1 μm to 0.2 μm, and a magnitude of 10~(-29) A with an increase in the i-layer width from 0.2 μm to 0.4 μm. Then, GaN-based avalanche photodiodes (i-layer 0.1 μm, 0.2 μm and 0.4 μm) with different-sized mesa were fabricated. Also, the measurement of dark current of all three different structures was performed, and their multiplication factors were given.
机译:暗电流对于基于GaN的雪崩光电二极管至关重要,因为暗电流会显着增加噪声电流并限制倍增系数。已经发现,在击穿电压开始时,对于雪崩光电二极管,带间隧穿电流是暗电流的主要来源。实验上,对于具有较薄本征层的GaN基雪崩光电二极管而言,即使在较低的偏置电压下,暗电流也随施加的电压几乎成倍增加。本文通过改变GaN基雪崩光电二极管的本征层(i层)宽度来研究其对带间隧穿电流的影响。使用了广泛使用的方程式来计算具有不同i层宽度(i层0.1μm,0.2μm和0.4μm)的雪崩光电二极管的带间隧穿电流。在-40 V时,随着i层宽度从0.1μm增加到0.2μm,幅度为10〜(-),带间隧穿电流显着减小了10〜(-15)A的幅度。 29)A,其i层宽度从0.2μm增加到0.4μm。然后,制造具有不同尺寸的台面的GaN基雪崩光电二极管(i层0.1μm,0.2μm和0.4μm)。同样,对所有三个不同结构的暗电流进行了测量,并给出了它们的倍增系数。

著录项

  • 来源
    《Semiconductor science and technology》 |2009年第9期|7.1-7.5|共5页
  • 作者单位

    State Key Laboratories of Transducer Technology, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, People's Republic of China;

    State Key Laboratories of Transducer Technology, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, People's Republic of China;

    State Key Laboratories of Transducer Technology, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, People's Republic of China;

    State Key Laboratories of Transducer Technology, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, People's Republic of China;

    State Key Laboratories of Transducer Technology, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, People's Republic of China;

    State Key Laboratories of Transducer Technology, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, People's Republic of China;

    State Key Laboratories of Transducer Technology, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, People's Republic of China;

    State Key Laboratories of Transducer Technology, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, People's Republic of China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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  • 入库时间 2022-08-18 01:32:05

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