机译:n型低温多晶硅薄膜晶体管中漏极电压扫描引起的退化
Department of Microelectronics, Soochow University, Suzhou 215006, People's Republic of China;
Department of Microelectronics, Soochow University, Suzhou 215006, People's Republic of China;
Department of Microelectronics, Soochow University, Suzhou 215006, People's Republic of China;
Department of Electronic and Computer Engineering, the Hong Kong University of Science and Technology, Kowloon, Hong Kong;
Department of Electronic and Computer Engineering, the Hong Kong University of Science and Technology, Kowloon, Hong Kong;
机译:低温多晶硅薄膜晶体管中由漏雪崩热载流子引起的导通电流衰减的预测模型
机译:低温N沟道单漏极和轻掺杂漏极多晶硅薄膜晶体管的漏极结附近的热载流子降解以及电场和电子浓度
机译:具有自对准上升源/漏(SARSD)的新型四面膜式低温多晶硅薄膜晶体管
机译:金属诱导的结晶N型多晶硅薄膜晶体管的自热降解研究
机译:通过晶粒增强技术形成的多晶硅薄膜晶体管的建模:金属诱导的横向结晶。
机译:利用IGZO和IGO沟道层的氧化物薄膜晶体管的漏极偏压降解现象的起源。
机译:高性能短通道双栅极低温多晶硅薄膜晶体管使用准分子激光结晶