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Drain voltage sweeping-induced degradation in n-type low-temperature polysilicon thin film transistors

机译:n型低温多晶硅薄膜晶体管中漏极电压扫描引起的退化

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摘要

Device degradation under the drain voltage (V_d) sweeping, where V_d lineally sweeps at a fixed gate voltage, has been investigated for n-type low-temperature (LT) polysilicon thin film transistors (TFTs). The degradation mechanism is found to be related to the dc hot carrier (HC) effect even for a sweeping time as short as ~μs. Since a routine device output measurement can induce significant (as large as 30%) on-current (I_(on)) degradation in such LT crystallized TFTs, only by using the optimized pulse IV method can one obtain an accurate output measurement without much affecting the device under test (e.g., <0.5% of I_(on) degradation).
机译:对于n型低温(LT)多晶硅薄膜晶体管(TFT),已经研究了在漏极电压(V_d)扫描(其中V_d以固定的栅极电压线性扫描)下器件的性能下降。甚至在短至〜μs的扫描时间内,发现其降解机理与直流热载流子(HC)效应有关。由于常规的器件输出测量可以在这种LT结晶TFT中引起明显的(高达30%)导通电流(I_(on)下降),因此,只有通过使用优化的脉冲IV方法,才能获得准确的输出测量值而不会产生太大影响被测设备(例如,I_(on)降级的<0.5%)。

著录项

  • 来源
    《Semiconductor science and technology》 |2010年第4期|p.23.1-23.5|共5页
  • 作者单位

    Department of Microelectronics, Soochow University, Suzhou 215006, People's Republic of China;

    Department of Microelectronics, Soochow University, Suzhou 215006, People's Republic of China;

    Department of Microelectronics, Soochow University, Suzhou 215006, People's Republic of China;

    Department of Electronic and Computer Engineering, the Hong Kong University of Science and Technology, Kowloon, Hong Kong;

    Department of Electronic and Computer Engineering, the Hong Kong University of Science and Technology, Kowloon, Hong Kong;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-18 01:31:41

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