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Auger de-excitation of different Er centers in Si:Er layers grown with sublimation molecular beam epitaxy

机译:升华分子束外延生长的Si:Er层中不同Er中心的俄歇激发

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摘要

The Auger de-excitation of erbium ions in sublimation molecular beam epitaxy (SMBE) grown Si:Er/Si layers differing in the type of Er centers is investigated. In layers with the precipitate-like emitting centers (T_(gr)~ 500 ℃) the Auger de-excitation of Er~(3+) ions depends on the ionization of donors with the ionization energy E_i ~ 38 meV and a concentration of about 1 • 10~(16) cm~(-3), whereas in layers with the Er-Ol centers (T_(gr) ~ 400 ℃) it is determined by the ionization of donors having a lower ionization energy E_i ~ 20 meV and a higher concentration of ~2 • 10~(17) cm~(-3). It is shown that the compensation ratio of SMBE grown n-Si:Er layers with the precipitate-like emitting centers reaches 10% and more. The nature of the compensating impurity has not been identified.
机译:研究了在Er中心类型不同的升华分子束外延(SMBE)生长的Si:Er / Si层中of离子的俄歇减磁。在具有类似析出物的发射中心(T_(gr)〜500℃)的层中,Er〜(3+)离子的俄歇去激发取决于电离能为E_i〜38 meV且给定浓度约为的施主的电离。 1•10〜(16)cm〜(-3),而在具有Er-Ol中心(T_(gr)〜400℃)的层中,则由电离能E_i〜20 meV和较高的浓度为〜2•10〜(17)cm〜(-3)。结果表明,具有沉淀样发射中心的SMBE生长的n-Si:Er层的补偿率达到10%以上。补偿杂质的性质尚未确定。

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  • 来源
    《Semiconductor science and technology》 |2012年第10期|p.105028.1-105028.6|共6页
  • 作者单位

    Institute for Physics of Microstructures, Russian Academy of Sciences, 603950, GSP-105, Nizhniy Novgorod, Russian Federation;

    Institute for Physics of Microstructures, Russian Academy of Sciences, 603950, GSP-105, Nizhniy Novgorod, Russian Federation;

    Institute for Physics of Microstructures, Russian Academy of Sciences, 603950, GSP-105, Nizhniy Novgorod, Russian Federation;

    Institute for Physics of Microstructures, Russian Academy of Sciences, 603950, GSP-105, Nizhniy Novgorod, Russian Federation;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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